Siemens Aktiengesellschaft

Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Gisela Sipos

Hartmut Enkisch

Markus Weiss

Johann Trenkler

Fokko Pieter Wieringa

Marco Wedowski

Michiel David Nijkerk

Nadyeh Shariloo, Legal Representative

Stephan Muellender

Wolfgang Schmidt

Hubert Adriaan Van Mierlo

Bernd Utz

Stephan Müllender

H A Van Mierlo

An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.

Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

The superconductor structure has a metallic, biaxially textured mount, an intermediate layer system deposited on the mount and including at least two intermediate layers composed of different oxidic materials and, on this, a high-T superconducting layer of the M Cu O type (RE&equals;rare earth; M&equals;alkaline-earth metal). The intermediate layer which faces the mount is composed of Y O , and the relatively thinner intermediate layer which faces the superconducting layer is composed of CeO . The layers are preferably grown heteroepitaxially.

Elongated superconductor structure with a high-Tc superconductor material and a metallic mount, and method for producing the structure

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Oberkochen, Germany

Gisela Sipos