Lexmark International, Inc.

Girish Shivaji Patil

Karthik Vaideeswaran

Brian Christopher Hart

James M Mrvos

John William Krawczyk

Sean Terrance Weaver

Gary Raymond Williams

Christopher John Money

Andrew McNees

Richard Lee Warner

Jason Todd Vanderpool

Craig Michael Bertelsen

Paul Timothy Spivey

Mark Doerre

Rich Wells

Jeanne M Saldanha Singh

Johnathan Lee Barnes

Steven Robert Komplin

James Harold Powers

David L Bernard

Byron Vencent Bell

Cory Nathan Hammond

Colin G Maher

Richard Louis Goin

Shirish Padmaker Mulay

Jon Brock Whitney

Kyle Benjamin Freels

David Bruce Rhine

Kirk Lawrence Stechschulte

Neal David Erickson

Ronald W Bunn

Tim Frasure

George Allan Ping

A method of controlling a height of an encapsulant material on an inkjet printhead is provided. The method includes dispensing the encapsulant material on an outer portion of the inkjet printhead. The encapsulant material is then depressed to reduce its height on the outer portion of the inkjet printhead. The encapsulant material may be depressed directly after dispensing or before it completely cures. The encapsulant material may be completely cured before reducing its height. The height of the cured encapsulant material may be reduced by removing a top portion of the encapsulant material through machining operation. Reducing the height of the encapsulant material on the inkjet printhead minimizes the distance of the nozzle plate of the inkjet printhead to the printing media, thus improving print quality.

Method of controlling the height of encapsulant on an inkjet printhead

An inkjet cartridge having an ink container including a venting structure with an orifice through a wall of the ink container in direct communication with a meniscus baffle extending into the interior of the ink container. An inkjet cartridge lid including serpentine trenches and orifices formed within a top surface. At least one of the serpentine trenches intersects with at least one of the orifices. The venting structure includes a corridor interposing at least two separate ink reservoirs and including opposing first and second ends. The first end of the corridor resides in communication with an external environment while the second end is partitioned to establish a separate passage in communication with each of the at least two separate ink reservoirs, each passage including a hollow extending into an interior of the ink reservoir.

Ink tank venting

Thick film layers for a micro-fluid ejection head, micro-fluid ejection heads, and methods for making micro-fluid ejection head and thick film layers. One such thick film layer is derived from a difunctional epoxy component having a weight average molecular weight ranging from about 2500 to about 4000 Daltons, a photoacid generator, an aryl ketone solvent, and an adhesion enhancing component. One such thick film layer has a cross-link density upon curing that increases the dimensional stability of the thick film layer sufficient to provide flow features therein having substantially vertical walls.

Thick film layers and methods relating thereto

A method of etching a semiconductor substrate. The method includes the steps of applying a photoresist etch mask layer to a device surface of the substrate. A select first area of the photoresist etch mask is masked, imaged and developed. A select second area of the photoresist etch mask layer is irradiated to assist in post etch stripping of the etch mask layer from the select second area. The substrate is etched to form fluid supply slots through a thickness of the substrate. At least the select second area of the etch mask layer is removed from the substrate, whereby mask layer residue formed from the select second area of the etch mask layer is significantly reduced.

Method for making a micro-fluid ejection device

A substantially inorganic planarization layer for a micro-fluid ejection head substrate and method therefor. The planarization layer includes a plurality of layers composed of one or more dielectric compounds and at least one spin on glass (SOG) layer having a total thickness ranging from about 1 microns to about 15 microns deposited over a second metal layer of the micro-fluid ejection head substrate. A top most layer of the planarization layer is selected from one or more of the dielectric compounds and a hard mask material.

Planarization layer for micro-fluid ejection head substrates

A micro-fluid ejection assembly and method therefor. The micro-fluid ejection assembly includes a silicon substrate having a fluid supply slot therein. The fluid supply slot is formed by an etch process conducted on a substrate using, a first etch mask circumscribing the fluid supply slot, and a second etch mask applied over a functional layer on the substrate.

Micro-fluid ejection assemblies

A fluid ejector, such as a printhead for an inkjet printer, comprising a substrate that includes a primary via formed therein, and a nozzle member overlying the substrate and including vertical nozzle chambers at least partially overlying the primary via and a corresponding fluid actuator (e.g., a heater) associated with the substrate.

Overhanging nozzles

A method of making a micro-fluid ejection head structure for a micro-fluid ejection device. The method includes applying a removable mandrel material to a semiconductor substrate wafer containing fluid ejection actuators on a device surface thereof. The mandrel material is shaped to provide fluid chamber and fluid channel locations on the substrate wafer. A micro machinable material is applied to the shaped mandrel and the device surface of the wafer to provide a nozzle plate and flow feature layer on the shaped mandrel and wafer. A plurality of nozzle holes are formed in the nozzle plate and flow feature layer. The shaped mandrel material is then removed from the device surface of the substrate wafer to provide fluid chambers and fluid channels in the nozzle plate and flow feature layer.

Micro-fluid ejection head structure

A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.

Microfluidic substrates having improved fluidic channels

A radiation curable resin composition having improved flexibility. The radiation curable composition having from about 5 to about 50 weight percent of a difunctional polymeric compound; from about 1 to about 10 weight percent of a photoinitiator; from about 1 to about 10 weight percent of a flexibilizer agent, wherein the flexibilizer agent has a molecular weight ranging from about 400 to about 10,000; and about 30 to about 90 weight percent of the non-photoreactive solvent, wherein the weight percents are based on the total weight of the resin composition. Ink jet print heads and ink jet printing apparatusess comprising ink jet print heads utilizing the radiation curable resin compositions are also included.

Radiation curable compositions having improved flexibility

A process for etching semiconductor substrates using a deep reactive ion etching process to produce through holes or slots (referred to collectively as 'slots') in the substrates. The process includes applying a first layer to a first surface of substrate to provide an etch mask material layer on the first surface of the substrate. A second layer is applied to a second surface of the substrate to provide an etch stop material layer on the second surface of the substrate. The first layer and the second layer have similar solubilities in one or more organic solvents. The substrate is etched from the first surface of the wafers to provide a slot in the substrate. After etching the substrate, the etch mask material layer and the etch stop material layer are removed by contacting the first surface and the second surface of the substrate with a single organic solvent.

Dry etching methods

Methods of forming a nozzle plate include forming a first reverse imageable positive photoresist layer on the substrate and protecting an area thereof adjacent an ink ejection element from ultraviolet energy while exposing other than the protected area to such energy. Thereafter, the non-protected area is rendered insoluble by heating. Thereafter, the protected area is exposed to ultraviolet energy to weaken its structure for later removal. A second reverse imageable positive resist layer gets formed on the first layer and exposed to ultraviolet energy in a region directly above the ink ejection element. In a single step, both the protected area of the first layer and the non-protected region of the second layer are removed to form an ink flow feature, a bubble chamber or an orifice of the nozzle plate. The remainders of the first and second layers become blanket exposed to ultraviolet energy and cured in place.

Inkjet printhead nozzle plate

A process for etching semiconductor substrates using a deep reactive ion etching process to produce through holes or slots (hereinafter 'slots') in the substrates. The process includes applying a first layer to a back side of a substrate as a first etch stop material. The first layer is a relatively soft etch stop material. A second layer is applied to the first layer on the back side of the substrate to provide a composite etch stop layer. The second layer is a relatively hard etch stop material. The substrate is etched from a side opposite the back side of the substrate to provide a slot in the substrate.

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Lexington, KY, United States of America

Girish Shivaji Patil