Ngimat Co.

Microcoating Technologies, Inc.

Girish N Deshpande

Andrew Tye Hunt

Subramaniam Shanmugham

Tzyy-Jiuan Jan Hwang

Miodrag Oljaca

Aimee Poda

George G Neuman

Wen-Yi Lin

Shara S Shoup

Tzyy Jiuan Hwang

Yongdong Jiang

Todd A Polley

Michelle Hendrick

Trifon Tomov

William D Danielson, Jr

Henry A Luten, Iii

Scott Flanagan

Peter W Faguy

Stein S Lee

Tzyy-Jiuan Jan

Eric J Yurtkuran

Nii Sowa Laye

William J Dalzell, Jr

Miodrag Oljara

Erika Moore

Jan Tzyy-Jiuan Hwang

Flame produced vapors for combustion chemical vapor deposition are redirected from the direction of the flame by differential atmospheric pressure, such as positive pressure provided by a blower or negative pressure provided by a vacuum. This allows, for example, lower surface temperatures of substrates being coated with flame-produced vapors and coating of interior surfaces.

Chemical vapor deposition methods for making powders and coatings, and coatings made using these methods

A coherent material is formed on a substrate () by providing a precursor suspension () in which particulates are suspended in a carrier fluid, and directing the precursor suspension () at the substrate () from a first source (). Generally contemporaneously with application of the deposited precursor suspension () to the surface, hot gases, e.g. hot gases produced by a flame (), are directed at the substrate () from a remote second source () to fuse the particulates into the coherent material.

Method of depositing materials

Epitatial thin films for use as buffer layers for high temperature superconductors, electrolytes in solid oxide fuel cells (SOFC), gas separation membranes or dielectric material in electronic devices, are disclosed. By using CCVD, CACVD or any other suitable deposition process, epitaxial films having pore-free, ideal grain boundaries, and dense structure can be formed. Several different types of materials are disclosed for use as buffer layers in high temperature superconductors. In addition, the use of epitaxial thin films for electrolytes and electrode formation in SOFCs results in densification for pore-free and ideal gain boundary/interface microstructure. Gas separation membranes for the production of oxygen and hydrogen are also disclosed. These semipermeable membranes are formed by high-quality, dense, gas-tight, pinhole free sub-micro scale layers of mixed-conducting oxides on porous ceramic substrates. Epitaxial thin films as dielectric material in capacitors are also taught herein. Capacitors are utilized according to their capacitance values which are dependent on their physical structure and dielectric permittivity. The epitaxial thin films of the current invention form low-loss dielectric layers with extremely high permittivity. This high permittivity allows for the formation of capacitors that can have their capacitance adjusted by applying a DC bias between their electrodes.

Epitaxial thin films

Tunable capacitors () have a dielectric material () between electrodes, which dielectric material comprises an insulating material () and electrically conductive material, () e.g., conductive nanoparticulates, dispersed therein. In certain cases, enhanced tune-ability is achieved when the dielectric material comprises elongated nanoparticulates (). Further enhanced tune-ability may be achieved by aligning elongated particulates in an electrode-to-electrode direction. Nanoparticulates may be produced by heating passivated nanoparticulates. Passivated nanoparticulates may be covalently bound within a polymeric matrix. High bias potential device structures can be formed with preferential mobilities.

Variable capacitors, composite materials

Coatings, particularly thin films, of polymeric material are produced in accordance with the invention by applying a finely divided aerosol of polymer solution to a substrate and substantially simultaneously applying an energy source to the applied solution to apply the solution. In cases where the polymer is cross-linking, the energy source assists in cross-linking of the polymer. The preferred energy source is a flame that may optionally or desirably deposit material along with the polymer spray. One particular aspect of the invention is directed to production of polyimide films. In accordance with another aspect of the invention, the co-deposition process is used to provide thin polysiloxane coatings on glass and other substrates.

Polymer coatings

An improved chemical vapor deposition apparatus and procedure is disclosed. The technique provides improved shielding of the reaction and deposition zones involved in providing CVD coatings, whereby coatings can be produced, at atmospheric pressure, of materials which are sensitive to components in the atmosphere on substrates which are sensitive to high temperatures and which are too large, or inconvenient, to process in vacuum or similar chambers. The improved technique can be used with various energy sources and is particularly compatible with Combustion Chemical Vapor Deposition (CCVD) techniques.

Apparatus and process for controlled atmosphere chemical vapor deposition

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Atlanta, GA, United States of America

Girish N Deshpande