Micron Technology Incorporated

Other

Stmicroelectronics S.r.l.

Giorgio Servalli

Marcello Mariani

Andrea Redaelli

Angelo Visconti

Andrea Locatelli

Fabio Pellizzer

Agostino Pirovano

Carmela Cupeta

Durai Vishak Nirmal Ramaswamy

Umberto Maria Meotto

Daniele Balluchi

Ugo Russo

Roberto Bez

Alessandro Grossi

Daniela Brazzelli

Emilio Camerlenghi

Augusto Benvenuti

Tecla Ghilardi

Pietro Petruzza

Cinzia Perrone

Marco Sforzin

Paolo Amato

Paolo Tessariol

Paolo Giuseppe Cappelletti

Alessandro Calderoni

Mauro Luigi Sali

Giulio Albini

Antonino Rigano

Cesare Clementi

Carlo Cremonesi

Caterina Riva

Alessia Pavan

Marcello Calabrese

Gianfranco Capetti

Livio Baldi

Agostino Pirevano

Gesare Clementi

Pietro Cantú

Methods, systems, and devices for formation for memory cells are described. A semiconductor device (e.g., a memory die) may include asymmetrical rows of conductive pillars and one or more dielectric materials. For example, the memory die may include a set of conductive pillars that are arranged in rows that are asymmetrically spaced. Here, a first row of conductive pillars may be a first distance away from a second row of conductive pillars and a second, larger distance away from a third row of conductive pillars. Additionally, the memory die may include one or more dielectric materials. In some cases, when depositing a dielectric material as part of a self-aligning process, the material may conformally line exposed surfaces according to a substantially uniform depth, which may decrease a subsequent quantity of masking operations to form the memory die.

Formation for memory cells

Some embodiments include an integrated assembly having pillars arranged in an array. The pillars have channel regions between upper and lower source/drain regions. Gating structures are proximate to the channel regions and extend along a row direction. Digit lines are beneath the pillars, extend along a column direction, and are coupled with the lower source/drain regions. Linear structures are above the pillars and extend along the column direction. Bottom electrodes are coupled with the upper source/drain regions. The bottom electrodes have horizontal segments adjacent the upper source/drain regions and have vertical segments extending upwardly from the horizontal segments. The vertical segments are adjacent to lateral sides of the linear structures. Ferroelectric-insulative-material and top-electrode-material are over the bottom electrodes. A slit passes through the top-electrode-material, is directly over one of the linear structures, and extends along the column direction.

Memory devices and methods of forming memory devices

Some embodiments include an integrated assembly having first and second pillars of semiconductor material. The first pillar includes a first source/drain region, and the second pillar includes a second source/drain region. First and second bottom electrodes are coupled with the first and second source/drain regions, respectively. The first and second source/drain regions are spaced from one another by an intervening region. First and second leaker-device-structures extend into the intervening region from the first and second bottom electrodes, respectively. Top-electrode-material extends into the intervening region and contacts the first and second leaker-device-structures. Ferroelectric-insulative-material is between the top-electrode-material and the bottom electrodes. Some embodiments include methods of forming integrated assemblies.

Integrated assemblies and methods of forming integrated assemblies

Some embodiments include an integrated assembly having first and second pillars of semiconductor material laterally offset from one another. The pillars have source/drain regions and channel regions vertically offset from the source/drain regions. Gating structures pass across the channel regions, and extend along a first direction. An insulative structure is over regions of the first and second pillars, and extends along a second direction which is crosses the first direction. Bottom electrodes are coupled with the source/drain regions. Leaker-device-structures extend upwardly from the bottom electrodes. Ferroelectric-insulative-material is laterally adjacent to the leaker-device-structures and over the regions of the bottom electrodes. Top-electrode-material is over the ferroelectric-insulative-material and is directly against the leaker-device-structures. Some embodiments include methods of forming integrated assemblies.

Systems, apparatuses, and methods related to memory activation timing management are described herein. In an examples, memory activation timing management can include receiving a first command associated with a set of memory cells, activating the set of memory cells to perform a memory access responsive to the first command, pre-charging the set of memory cells associated with the first command, receiving a second command associated with the set of memory cells, determining that the set of memory cells associated with the first command is a recently activated set of the plurality of sets of memory cells, imparting a delay, and applying a sensing voltage to the set of memory cells associated with the second command to perform a memory access responsive to the second command.

Memory activation timing management

Methods, systems, and devices for differential storage in memory arrays are described. A memory device may include pairs of memory cells configured to store a single logic state (e.g., a single bit of information). Additionally, the memory device may include sense amplifiers configured to sense the logic state based on a difference between a voltage of a first ferroelectric memory cell of the pair of memory cells and a voltage of a second ferroelectric memory cell of the pair of memory cells. In one example, the memory device may include pairs of memory cells within a single memory array on a single level. Here, each memory cell pair may include a memory cells that are each coupled with a same word line and plate line. Additionally, each memory cell pair may include memory cells each coupled with different digit lines.

Differential storage in memory arrays

Some embodiments include an integrated assembly having a first bottom electrode adjacent to a second bottom electrode. An intervening region is directly between the first and second bottom electrodes. Capacitor-insulative-material is adjacent to the first and second bottom electrodes. The capacitor-insulative-material is substantially not within the intervening region. Top-electrode-material is adjacent to the capacitor-insulative-material. Some embodiments include methods of forming integrated assemblies.

Methods, systems, and devices for biasing a memory cell during a read operation are described. For example, a memory device may bias a memory cell to a first voltage (e.g., a read voltage) during an activation phase of a read operation. After biasing the memory cell to the first voltage, the memory device may bias the memory cell to a second voltage greater than the first voltage (e.g., a write voltage) during the activation phase of the read operation. After biasing the memory cell to the second voltage, the memory device may initiate a refresh phase of the read operation. Based on a value stored by the memory cell prior to biasing the memory cell to the first voltage, the memory device may initiate a precharge phase of the read operation.

Memory cell biasing techniques during a read operation

Methods, systems, and devices for techniques to manufacture ferroelectric memory devices are described. In some cases, a memory array may be manufactured using a self-aligned manufacturing technique. For example, a continuous layer of dielectric material may be formed over an assembly which includes an array of transistors coupling contacts on the surface of the assembly with a set of digit lines. In some cases, an array of cavities may be etched into the dielectric material, each cavity exposing a set of contacts. A set of bottom electrodes corresponding to the set of contacts may be formed on sidewalls in each cavity, for example by depositing a layer of electrode material and etching the electrode material using a variety of hard masks.

Techniques to manufacture ferroelectric memory devices

Some embodiments include an assembly having first and second pillars. Each of the pillars has an inner edge and an outer edge. A first gate is proximate a channel region of the first pillar. A second gate is proximate a channel region of the second pillar. A shield line is between the first and second pillars. First and second bottom electrodes are over the first and second pillars, respectively; and are configured as first and second angle plates. An insulative material is over the first and second bottom electrodes. The insulative material may be ferroelectric or non-ferroelectric. A top electrode is over the insulative material. Some embodiments include methods of forming assemblies.

At least one portion of a memory array may be arranged to provide high density non-volatile random access memory (HIGH DENSITY NON-VOLATILE RAM) while at least one other portion of the memory array may be arranged to provide dynamic random access memory (DRAM)-like memory. In some examples, the memory array may be arranged by programming one or more configuration devices. In some examples, the configuration device may include one or more switches to couple one or more memory cells to a sense amplifier. In some examples, the configuration device may include fuses and/or antifuses to couple one or more memory cells to a sense amplifier. In some examples, the portions of the memory array may be reconfigurable from one arrangement to another arrangement.

Apparatuses, systems, and methods for configurable memory

Implementations described herein relate to various structures, integrated assemblies, and memory devices. In some implementations, an integrated assembly includes a pillar having an upper source/drain, a middle source/drain, a lower source/drain, an upper channel between the upper source/drain and the middle source/drain, and a lower channel between the middle source/drain and the lower source/drain. The integrated assembly includes a gate pair that includes a first gate and a second gate. The first gate is positioned on a first side of the pillar at a first height, and the second gate is positioned on a second side of the pillar, that is opposite the first side, at a second height that is different from the first height. The integrated assembly includes a capacitor that is electrically coupled with the upper source/drain. Some implementations include methods of forming the various structures, integrated assemblies, and memory devices.

Memory device having a diagonally opposite gate pair per memory cell

Provided is a computing system including a memory system in communication with a host, to store data therein. The memory system includes a memory having a plurality of memory components coupled to the controller via a memory interface; and a memory controller configured to communicate with the memory to control data transmission and performing scrubbing operation of the memory components and detecting a region of the memory to be sanitized and performing a sanitization operation of the detected region to prevent the occurrence of failure.

Growing community of inventors

Fara Gera d'Adda, Italy

Giorgio Servalli