Daikin Industries, Ltd.

Other

Sagami Chemical Research Center

Sony Corporation

Panasonic Corporation

Tokyo Electron Limited

Sanyo Electric Co., Ltd.

Renesas Electronics Corporation

National Institute of Advanced Industrial Science and Technology

Hitachi-kokusai Electric Inc.

Canon Anelva Corporation

Kanto Denka Kogyo Co., Ltd.

Ginjiro Tomizawa

Teruo Umemoto

Kenji Adachi

Yutaka Ohira

Ikuo Yamamoto

Shinichi Minami

Yoshio Funakoshi

Masayuki Nagayoshi

Sumi Ishihara

Akira Sekiya

Yuki Mitsui

Taisuke Yonemura

Katsuya Fukae

Satoshi Oishi

Kyoichi Tomita

Kosuke Kawada

Disclosed is a fluorine-containing polymer having: (A) a repeating unit derived from a fluorine-containing monomer which is represented by the following formula:CH&#x2550;C(&#x2014;X)&#x2014;C(&#x2550;O)&#x2014;Y&#x2014;[&#x2014;(CH)&#x2014;Z&#x2014;]&#x2014;(CH)&#x2014;Rf&#x2003;&#x2003;(I)(B) a repeating unit derived from a monomer containing no fluorine atom, and if necessary (C) a repeating unit derived from a crosslinkable monomer. This fluorine containing polymer has excellent water repellency, oil repellency and antifouling property.

Fluorine-containing monomer, fluorine-containing polymer and surface treating agent

Disclosed is a fluorine-containing polymer having:

To provide a practical method of manufacturing fluorine compounds in a small number of steps that can carry out fluorination reaction of substrates using easily available fluorinating agents that can be inexpensively produced industrially, and recover precursors of the fluorinating agents generated accompanying the reaction quantitatively in an easy operation, and a method of recovery and regeneration of the precursors of the fluorinating agents. N-Fluoro-quaternary-nitrogen-onium tetrafluoroborate salts represented by the general formula (1) as the fluorinating agents are used.N-Hydro-quaternary-nitrogen-onium tetrafluoroborate salts represented by the general formula (2) generated accompanying the reaction are separated and recovered from the reaction mixture by means of depositing as crystals by the addition of solvents with a low affinity to the salts to the reaction mixture after the reaction.

Method of manufacturing fluorine compounds, and a method of recovering or regenerating precursors of fluorinating agents

The first chamber cleaning gas and the first silicon-containing film-etching gas of the present invention comprise at least one compound selected from the group consisting of FCOF, CF OCOF and CF OCF OCOF, and O in the specific amount, and optionally other gases. The second chamber cleaning gas and the second silicon-containing film-etching gas comprise CF COF, C F COF or CF (COF) and O in specific amounts, and optionally may comprise other gases. The chamber cleaning gases and silicon-containing film etching gases of the present invention have a low global warming potential and hardly generate substances in the exhaust gases such as CF , etc, which are harmful to the environment and have been perceived as contributing to global warming. Therefore, the gases are friendly to the global environment, and have easy handling and excellent exhaust gas treating properties. Further, the chamber cleaning gases of the invention have excellent cleaning rate.

Cleaning gases and etching gases

Process for preparing N,N'-difluorodiazoniabicycloalkane salt,

Conjugated N-fluoropyridinium salt-containing polymer and use of the same

Process for preparing fluorine-containing dicarbonyl compound

A substituted N-fluoropyridiniumsulfonate of the formula: ##STR1## in which R.sup.1 is a hydrogen atom, a halogen atom or a C.sub.1 -C.sub.4 alkyl or haloalkyl group, and R.sup.2 is a C.sub.1 -C.sub.4 alkyl or haloalkyl group, which is an effective fluorinating agent.

Certain substituted N-fluoropyridiniumsulfonates

A pyridine-compound is reacted with fluorine together with a Bronsted acid-compound or Lewis acid to form a N-fluoropyridinium salt which is very active to other compounds but is very selective for the preparation of a desired product and this product is very useful for a fluorine-introducing agent which makes it useful for the preparation of fluoro-compounds such as thyroid inhibitor.

N-fluoropyridinium salt and process for preparing same

Growing community of inventors

Osaka, Japan

Ginjiro Tomizawa