Applied Materials Israel Limited

Gil Shabat

Amit Batikoff

Michele Dalla-Torre

Adi Dafni

In accordance with an aspect of the presently disclosed subject matter, there is provided an analysis system for classifying possible defects identified within an inspection image of an inspected object, the system comprising a pattern matcher configured to determine an anchor location with respect to the inspection image, based on a matching of a template and a portion of the inspection image; wherein an accuracy of the determining of the anchor location exceeds a resolution of the inspection image; a distribution analysis module configured to determine, based on the anchor location and a mask which defines different segments within an area, a distribution of a potential defect with respect to one or more of the segments; and a classifier, configured to classify the potential defect based on the distribution.

System, method and computer program product for classification within inspection images

An analysis system for detection of defects within an inspection image of an inspected object, the inspection image comprising a plurality of pixels, the system including: a computerized segmentation module configured to segmentize the inspection image based on multiple anchor locations and on a mask which defines multiple mask-segments, by assigning each part out of multiple parts of the inspection image to a respective image-segment selected out of a multiple image segments, wherein the multiple image segments correspond to at least one mask-segment of said multiple mask-segments; and a defect detection processor configured to determine a presence of a defect in the inspection image based on the segmentation at least by assessing each pixel out of a plurality of pixels of the inspection image.

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Raanana, Israel

Gil Shabat