Hanwha Chemical Corporation

Korea Research Institute of Chemical Technology

Gil Ho Kim

Gui Ryong Ahn

Dong Ho Lee

Joo Hee Han

Sang Ah Kim

Won Ik Lee

Yong Ki Park

Won Choon Choi

Na Young Kang

Bo Kyung Kim

Hwi Min Seo

Joon Hwan Kim

Ki J Hwang

Jea Sung Park

Ji Ho Kim

Yeong D Gong

Woo Hyung Lee

Kyu Hak Park

The present invention relates to a gas distribution unit for a fluidized bed reactor system, a fluidized bed reactor system having the gas distribution unit, and a method for preparing granular polysilicon using the fluidized bed reactor system. The gas distribution unit for a fluidized bed reactor system according to the present invention enables gas flow rate control and gas composition control for each zone within the plenum chamber. In addition, a fluidized bed reactor system having the gas distribution unit enables shape control of a fluidized bed (in particular, transition between a bubbling fluidized bed and a spout fluidized bed). The method for preparing granular polysilicon using the fluidized bed reactor system not only simultaneously improves process stability and productivity, but also enables more flexible handling in the event of an abnormal situation.

Gas distribution unit for fluidized bed reactor system, fluidized bed reactor system having the gas distribution unit, and method for preparing granular polycrystalline silicon using the fluidized bed reactor system

A method for preparing trichlorosilane according to an embodiment of the present invention comprises the steps of: supplying surface-modified metal silicide and metal grade silicon to a reaction unit; supplying silicon tetrachloride and hydrogen to the reaction unit; and supplying a product, which is generated by a reaction of metal grade silicon, silicon tetrachloride, and hydrogen in the presence of metal silicide in the reaction unit, to a separation unit, and separating a trichlorosilane component. In cases where a silicon tetrachloride hydrochlorination reaction is performed using the method for preparing trichlorosilane according to the embodiment of the present invention, the yield of trichlorosilane can be raised.

Method for surface-modifying metal silicide, and method and apparatus for preparing trichlorosilane using surface-modified metal silicide

Provided is a method of preparing trichlorosilane, more particularly, a method of preparing trichlorosilane which trichlorosilane can be obtained with an improved yield using a catalyst-supported silicon.

Method of preparing trichlorosilan

The present invention relates to a purification method and a purification apparatus for off-gas. More specifically, the present invention relates to a purification method and a purification apparatus for off-gas, capable of lowering the concentration of hydrogen chloride and separating high-purity hydrogen from the off-gas, which is discharged after performing a polysilicon deposition process by a chemical vapor deposition reaction.

Purification method and purification apparatus for off-gas

5-hydroxypyrazole derivatives and the insecticidal compositions containing the same are provided. Said derivatives exhibit excellent insecticidal effects and bioactivities, and also they have a broad-spectrum of use.

Phosphoric and thiophosphonic acid derivatives of 5-hydroxypyrazoles,

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Daejeon, South Korea

Gil Ho Kim