Ilika Technologies Limited

Gianfranco Aresta

Brian Elliott Hayden

Thomas Risbridger

Louise Turner

Samuel Guerin

Thomas Foley

Owain Clark

David Michael Laughman

William Richardson

Alexandros Anastasopoulos

Robert Noble

Duncan Smith

David Laughman

A method is provided for fabricating a component material for a battery cell. The method comprises the steps of: providing a partially-fabricated battery cell, the partially-fabricated battery cell comprising a substrate having a planar deposition surface consisting of a first face of the substrate and a first battery component layer provided on the planar deposition surface, the substrate having a plurality of further surfaces, the planar deposition surface and the plurality of further surfaces defining the body of the substrate therebetween; wherein: the first battery component layer contains charge-carrying metal species and has an exposed surface; one or more electrically conductive or semi-conductive pathways extend through at least a portion of the substrate, each of the one or more pathways connecting the planar deposition surface to one of the plurality of further surfaces; and the partially-fabricated battery cell is held in position within a deposition chamber by a holding structure and each site of connection between one of the one or more pathways and the holding structure is electrically insulating; the method further comprising the step of depositing a second battery component layer on the first battery component layer, wherein the depositing comprises forming a plasma within the deposition chamber.

Method of fabricating a component material for a battery cell

The present invention provides a vapour deposition method for preparing an amorphous lithium borosilicate compound or doped lithium borosilicate compound, the method comprising: providing a vapour source of each component element of the compound, wherein the vapour sources comprise at least a source of lithium, a source of oxygen, a source of boron and a source of silicon, and, optionally, a source of at least one dopant element; providing a substrate at a temperature of less than about 180° C.; delivering a flow of said lithium, said oxygen, said boron and said silicon, and, optionally, said dopant element, wherein the rate of flow of said oxygen is at least about 8×10m/s; and co-depositing the component elements from the vapour sources onto the substrate wherein the component elements react on the substrate to form the amorphous compound.

Vapor deposition method for preparing an amorphous lithium borosilicate

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Southampton, United Kingdom

Gianfranco Aresta