Asml Netherlands B.v.

Gheorghe Tanasa

Marcio Alexandre Cano Miranda

Ivo Adam Johannes Thomas

Hans Jansen

Siebe Landheer

Arnout Johannes Meester

Giovanni Luca Gattobigio

Jeroen Peter Johannes Bruijstens

Harold Sebastiaan Buddenberg

Maurice Martinus Johannes Van Der Lee

Floor Lodewijk Keukens

Richard Joseph Bruls

Theodorus Wilhelmus Polet

Bauke Jansen

Jimmy Matheus Wilhelmus Van De Winkel

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Erik Henricus Egidius Catharina Eummelen

Cornelius Maria Rops

Rogier Hendrikus Magdalena Cortie

Ferdy Migchelbrink

Laurentius Catrinus Jorritsma

Koen Cuypers

Mark Johannes Hermanus Frencken

Miao Yu

Evert Van Vliet

Pepijn Van Den Eijnden

Marcel Maria Cornelius Franciscus Teunissen

Petrus Martinus Gerardus Johannes Arts

Lambertus Dominicus Noordam

Jantien Laura Van Erve

Jeroen Johannes Sophia Maria Mertens

Martinus Hendrikus Antonius Leenders

Youri Johannes Laurentius Maria Van Dommelen

Arnoldus Johannes Martinus Jozeph Ras

Peter Paul Steijaert

Daan Daniel Johannes Antonius Van Sommeren

Jeroen Arnoldus Leonardus Johannes Raaymakers

Robert Douglas Watso

Marijn Wouters

Joao Paulo Da Paz Sena

Henricus Martinus Dorotheus Van Lier

Seerwan Saeed

Han Henricus Aldegonda Lempens

Anthonius Martinus Cornelis Petrus De Jong

Gerardus Adrianus Antonius Maria Kusters

Maarten Holtrust

Antonius Martinus Cornelis Petrus De Jong

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

Cleaning device and method of cleaning

An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

Inspection substrate and an inspection method

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure

Lithographic apparatus and method of operating the apparatus

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.

Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure

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Eindhoven, Netherlands

Gheorghe Tanasa