Samsung Electronics Co., Ltd.

Geun-Young Song

Yun-seok Choi

Chang-Gil Ryu

Jin-Suk Hong

Jae-Chang Lee

Eun-Seok Lee

Ki-Yeon Chu

Provided is a substrate cleaning apparatus including: a cleaning bath configured to accommodate a substrate having a first surface and a second surface; a substrate support configured to support the substrate; first and second nozzle bars provided in the cleaning bath to be rotatable in a plane parallel with the substrate, each of the first and the second nozzle bars including a passage; a plurality of nozzles provided along a longitudinal direction of each of the first and the second nozzle bars and configured to spray the cleaning solution from the passage of each of the first and the second nozzle bars to the substrate; and first and second brushes, the first brush provided on a first side of the substrate and configured to clean the first surface and the second brush provided on a second side of the substrate and configured to clean the second surface of the substrate.

Substrate cleaning apparatus

A polishing head includes a substrate carrier to suck and to pressurize a substrate, and a retainer ring secured under the substrate carrier, the retainer ring surrounding a circumference of the substrate and including a cooling channel therethrough to circulate a coolant fluid.

Polishing head and polishing carrier apparatus having the same

Growing community of inventors

Suwon-si, South Korea

Geun-Young Song