Samsung Electronics Co., Ltd.

Geun-Soo An

Gi-Cheon Yoon

Won-Kie Chang

Gi-cheon Yoon

In an apparatus and a method of forming a photoresist pattern, a photoresist-coating section coats a substrate with a photoresist composition to form a photoresist film. A light is irradiated onto the photoresist film by using an exposure section, and a developing section develops the photoresist film. A residue-sensing section senses a residue of the developed photoresist film to generate information of the residue corresponding to the sensed residue. A residue-removing section sprays a solvent in a region of the residue corresponding to the information of the residue to dissolve the residue, and the residue-removing section absorbs the residue dissolved by the solvent. Therefore, the residue is effectively removed by spraying the solvent in the region of the residue and absorbing the residue dissolved by the solvent.

Apparatus and method of forming a photoresist pattern, and repair nozzle

An inline transfer system and method are provided for the secure transport and efficient processing of substrates such as glass substrates or semiconductor devices. A rotary conveyor is provided that includes a plurality of air nozzles which inject air to move a substrate above the plurality of air nozzles without the plurality of air nozzles making contact with the substrate. At least two independent processing units are operably coupled to the rotary conveyor. Advantageously, because a plurality of substrates may be processed in parallel, greater efficiency and flexibility are provided. Because the substrate can be moved without physical contact between the structure of the air nozzles and the substrate, the transfer is secure, clean, and efficient.

Inline transfer system and method

A transfer apparatus is provided for the transport of transfer objects such as glass substrates or semiconductor devices in which cleanliness and secure transport are of major concern. A plurality of air nozzles inject air through the plurality of air nozzles to hold a transfer object in place above or below the plurality of air nozzles without the plurality of air nozzles making contact with the transfer object. The plurality of air nozzles are positioned perpendicular to the transfer object to stop and/or engage the transfer object in a rest position. The plurality of air nozzles are inclined to a specified angle to move the transferred object in a desired direction. Advantageously, because the transfer object is moved without physical contact between the structure of the air nozzles and the transfer object, the transfer is secure, clean, and efficient.

Transfer apparatus

Disclosed herein is an apparatus for conveying substrates, which is capable of efficiently conveying large substrates and has a function to temporarily store the substrate in a buffer unit. The apparatus includes a substrate support unit, a conveying unit, and the buffer unit. The substrate support unit supports the substrate thereon. The conveying unit sequentially conveys the substrate support unit to a plurality of processing units. The buffer unit is provided at a predetermined portion of the conveying unit to move the substrate support unit upward away from the conveying unit in a vertical direction, thus temporarily storing the substrate support unit therein while spacing the substrate support unit apart from the conveying unit. The substrate conveying apparatus thus efficiently conveys the substrates, regardless of sizes of the substrates, while temporarily storing the substrates to buffer a difference in the processing time.

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Cheonan-si, South Korea

Geun-Soo An