Asml Netherlands B.v.

Gert-Jan Gerardus Johannes Thomas Brands

Paulus Martinus Maria Liebregts

Koen Steffens

Ronald Van Der Ham

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Michel Riepen

Franciscus Johannes Joseph Janssen

Marcio Alexandre Cano Miranda

Paul Petrus Joannes Berkvens

Patrick Johannes Wilhelmus Spruytenburg

Christophe De Metsenaere

Mathieus Anna Karel Van Lierop

Joris Johan Anne-Marie Verstraete

Daniël Jozef Maria Direcks

Christiaan Alexander Hoogendam

Daniel Jozef Maria Direcks

Eva Mondt

Nicolaas Rudolf Kemper

Marco Koert Stavenga

Marcus Johannes Van Der Zanden

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Martinus Hendrikus Antonius Leenders

Johannes Henricus Wilhelmus Jacobs

Sergei Shulepov

Roelof Frederik De Graaf

Erik Henricus Egidius Catharina Eummelen

Richard Joseph Bruls

Marinus Jochemsen

David Bessems

Youri Johannes Laurentius Maria Van Dommelen

Richard Moerman

Danny Maria Hubertus Philips

Pieter Mulder

Jan Cornelis Van Der Hoeven

Fabrizio Evangelista

Paul William Scholtes-Van Eijk

Pieter Lein Joseph Gunter

Rudy Jan Maria Pellens

Jan Willem Cromwijk

Menno Fien

Hua Li

Coen Cornelis Wilhelmus Verspaget

Erik Witberg

Ralph Joseph Meijers

David Lucien Anstotz

Casper Roderik De Groot

Vijay Kumar Badam

Thijs Egidius Johannes Knaapen

Rudolf Adrianus Joannes Maas

Martijn Hendrik Kamphuis

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.

Immersion lithographic apparatus and device manufacturing method

A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller.

A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.

Lithographic apparatus having parts with a coated film adhered thereto

Growing community of inventors

Waalre, Netherlands

Gert-Jan Gerardus Johannes Thomas Brands