Asml Netherlands B.v.

Asml Holding N.v.

Gerrit Van Den Bosch

Paul Janssen

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Frits Van Der Meulen

Derk Servatius Gertruda Brouns

Robert Gabriël Maria Lansbergen

Matthias Kruizinga

Jeroen Dekkers

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Jérôme François Sylvain Virgile Van Loo

Maarten Mathijs Marinus Jansen

Marc Bruijn

Ronald Harm Gunther Kramer

Jorge Manuel Azeredo Lima

Johannes Petrus Martinus Bernardus Vermeulen

Johan Hendrik Klootwijk

Pieter-Jan Van Zwol

Antonius Franciscus Johannes De Groot

Mária Péter

David Ferdinand Vles

Arnoud Willem Notenboom

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Adrianus Johannes Maria Giesbers

Evgenia Kurganova

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Aleksandar Nikolov Zdravkov

Hrishikesh Patel

Angelo Cesar Peter De Klerk

Silvester Matheus Reijnders

Chaitanya Krishna Ande

Peter Simon Antonius Knapen

Hendrikus Jan Wondergem

Johannes Joseph Janssen

Marcel Peter Meijer

Jacobus Maria Dings

Wouter Rogier Meijerink

Maurice Leonardus Johannes Janssen

Roland Jacobus Johannes Kerstens

Raymond Olsman

Michel Loos

Geert Middel

Frank Johannes Christiaan Theuerzeit

Anne Johannes Wilhelmus Van Lievenoogen

Stephen Roux

Richard Joseph Bruls

Matthew Lipson

Joseph Harry Lyons

Erik Willem Bogaart

Sandra Van Der Graaf

Mohammad Reza Kamali

Sander Van Den Heijkant

Martinus Jozef Maria Kester

Robert Gabriel Maria Lansbergen

Jerome Francois Sylvain Virgile Van Loo

Martinus Jozef Maria Kesters

Servatius Derk

Joseph H Lyons

Alexandar Nikolov Zdravkov

Maria Peter

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Pellicle and pellicle assembly

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Pellicle attachment apparatus

A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

Growing community of inventors

Geldermalsen, Netherlands

Gerrit Van Den Bosch