Heraeus Quarzglas Gmbh & Co Kg

Heraeus Noblelight Gmbh

Heraeus Quartz America LLC

Solarworld Innovations Gmbh

Gerrit Scheich

Christian Schenk

Nadine Tscholitsch

Frank Wessely

Waltraud Werdecker

Jürgen Weber

Nils Christian Nielsen

Nils-Christian Nielsen

Walter Lehmann

Michael Hünermann

Christian Neumann

Thomas Kayser

Matthias Otter

Boris Gromann

Nigel Robert Whippey

Bernhard Freudenberg

Ashur J Atanos

Matthew J Donelon

Norbert Traeger

Kathrin Wissel-Stoll

Mirko Wittrin

Lotta Gaab

Joachim Peekhaus

Markus Wilde

Björn Roos

Andreas Schreiber

Kaspars Dadzis

Gerd Fischer

Bernhard Franz

Sebastian Pankalla

Ursula Klett

Marcus Constantin Göbel

Frank Nuernberg

Stephan Moritz

Kerstin Meyer-Merget

Andreas Goetzendorfer

Dirk Michel

Sandra Nadolny

Franziska Wolny

Matthias SÖHN

Marcus Constantin GÖBEL

Bastian Weisenseel

A quartz glass body and a process for the preparation of a quartz glass body is disclosed. One process includes providing a silicon dioxide granulate from a pyrogenic silicon dioxide powder, making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. In at least one process a silicon component different from silicon dioxide is added. A quartz glass body is obtainable by this process. A light guide, an illuminant and a formed body, are each obtainable by further processing of the quartz glass body.

Increase in silicon content in the preparation of quartz glass

A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 &#x3bc;m.

Diffuser material of synthetically produced quartz glass and method for the manufacture of a molded body consisting fully or in part thereof

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, making a glass melt out of silicon dioxide granulate, and making a quartz glass body out of at least part of the glass melt. The size of the quartz glass body is reduced to obtain a quartz glass grain. The quartz glass body is processed to make a preform and an opaque quartz glass body is made from the preform. One aspect further relates to an opaque quartz glass body which is obtainable by this process. One aspect further relates to a reactor and an arrangement, which are each obtainable by further processing of the opaque quartz glass body.

Preparation of an opaque quartz glass body

In one method for producing opaque quartz glass, a green body is produced from a slip containing fine, amorphous SiOparticles and coarse SiOreinforcement bodies and the green body is sintered by way of a sintering treatment into a blank made from the opaque quartz glass. The reinforcement bodies with a specific density Dare here embedded in a SiOmatrix with a specific glass density D. Starting from this, in order to provide a blank of opaque quartz glass that is less susceptible to cracking and illustrates homogeneous transmission even in the case of small wall thicknesses, in one aspect sinterable reinforcement bodies are used, the specific density Dof which prior to the sintering treatment is lower than the specific glass density D, and which due to the sintering treatment reach the specific density Dwhich differs from the specific glass density Dby less than 10%.

Method for producing opaque quartz glass, and blank made from the opaque quartz glass

An infrared emitter is provided. The infrared emitter includes a substrate made of an electrically insulating material. The substrate includes a surface that contacts a printed conductor made of a resistor material that is electrically conducting and generates heat when current flows through it. The electrically insulating material includes an amorphous matrix component into which an additional component is embedded that absorbs in the spectral range of infrared radiation. At least a part of the surface is configured with a cover layer made of porous glass, whereby the printed conductor is embedded, at least in part, in the cover layer.

Infrared emitter

A method for producing a pore-containing opaque quartz glass includes: (a) producing porous SiOgranulate particles from synthetically produced SiO, (b) thermally densifying the SiOgranulate particles to form partly densified SiOgranulate particles, (c) forming a dispersion from the partly densified SiOgranulate particles, (d) comminuting the partly densified SiOgranulate particles to form a slip containing comminuted SiOgranulate particles, (e) shaping the slip into a shaped body and forming a porous SiOgreen body with a green density rG, and (f) sintering the SiOgreen body into opaque quartz glass. To produce opaque quartz glass that is also suited for the use of spray granulate, during step (b), partly densified SiOgranulate particles are produced with a specific surface BET-(A) between 0.025 and 2.5 m/g, and during step (d), comminuted SiOgranulate particles are produced with a specific surface BET-(B) between 4 and 10 m/g.

Method for producing a pore-containing opaque quartz glass

A low cost method for producing a mechanically and thermally stable composite body containing a first layer of a material with a high silicic acid content and an additional component connected to a second layer of a material with a high silicic acid content and an additional component in a second concentration differing from the first concentration is provided. The method involves (a) preparing a first slurry layer having a free surface using a first shirt mass containing SiOparticles and an additional component dispersed in a first dispersing agent, (b) providing a second slurry mass containing SiOparticles and an additional component in a second concentration dispersed in a second dispersing agent, (c) forming a composite-body intermediate product by applying the second slurry mass to the free surface of the first slurry layer, and (d) heating the composite-body intermediate product while forming the composite body.

Method for producing a composite body of a material with a high silicic acid content

In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm, and at a temperature of 1000&#xb0; C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 &#x3bc;m.

Composite material, heat-absorbing component, and method for producing the composite material

A method for producing a solar crucible includes providing a crucible base body of transparent or opaque fused silica having an inner wall, providing a dispersion containing amorphous SiOparticles, applying a SiO-containing slip layer to at least a part of the inner wall by using the dispersion, drying the slip layer to form a SiO-containing grain layer and thermally densifying the SiO-containing grain layer to form a diffusion barrier layer. The dispersion contains a dispersion liquid and amorphous SiOparticles that form a coarse fraction and a fine fraction with SiOnanoparticles. The weight percentage of the SiOnanoparticles based on the solids content of the dispersion is in the range between 2 and 15% by weight. The SiO-containing grain layer is thermally densified into the diffusion barrier layer through the heating up of the silicon in the crystal growing process.

Silicon block, method for producing the same, crucible of transparent or opaque fused silica suited for performing the method, and method for the production thereof

A method for producing a coated component consisting of transparent or opaque fused silica comprises a method step in which a SiOgranulation layer is applied to a coating surface of a substrate, which in the area of the free surface has a relatively great granulation fine fraction. Starting from this, in order to achieve a smooth, preferably also dense surface layer, it is suggested according to the invention that the application of the SiOgranulation layer comprises (i) providing a dispersion containing a dispersion liquid and amorphous SiOparticles which form a coarse fraction with particle sizes ranging between 1 &#x3bc;m and 50 &#x3bc;m and a fine fraction of SiOnanoparticles having particle sizes of less than 100 nm, wherein the solids content of the dispersion is between 70 and 80 wt.-%, and of which between 2 wt.-% and 15 wt.-% are the SiOnanoparticles, (ii) applying the dispersion to the coating surface by casting or spraying it thereonto so as to form a slurry layer having a layer thickness of at least 0.3 mm; and (iii) drying the slurry layer by removing the dispersion liquid at a rate and in a direction such that under the action of the dispersion liquid being removed the fine fraction is enriched in the outer portion of the granulation layer, thereby forming a casting skin.

Method for producing a coated component of transparent or opaque fused silica

The invention relates to a process for producing a paste-like SiOcomposition using an SiOslip which allows simple intermediate storage and transport conditions without the processability of the slip to give the paste-like SiOcomposition being impaired thereby. According to the invention, it is for this purpose proposed that a homogeneous SiObase slip be subjected to a drying step to form a dry SiOcomposition and subsequently be processed further by means of a remoistening step to give the paste-like SiOcomposition, where the remoistening step comprises the addition of liquid to the dry SiOcomposition to form a paste-like kneadable SiOcomposition having a solids content of more than 85% by weight. The invention further relates to the use of a paste-like SiOcomposition as repair composition.

[object Object]

In a known method, a SiOslip layer is applied to a basic quartz glass body by means of spraying on an SiOslip, the slip layer is dried and sintered to form an SiO-containing functional layer. In order to permit the reproducible production of a functional quartz glass layer, even in the case of surfaces that are curved or inclined with respect to the vertical, having high layer thicknesses which satisfy high requirements on the layer homogeneity, the invention proposes that the slip contain the following components in a dispersion liquid: splintery, amorphous SiOgranules having a gain size distribution having a Dvalue in the range of 3 &#x3bc;m to 30 &#x3bc;m and having a proportion by weight of at least 10% by weight, based on the total solids content; spherical, amorphous SiOparticles having a particle size distribution having a Dvalue in the range of 1 &#x3bc;m to 50 &#x3bc;m and having a proportion by weight of at least 30% by weight, based on the total solids content; SiOnano particles having particle sizes of less than 100 nm and having a proportion by weight between 0.2% and 10% by weight, based on the total solids content; and a non-ionic, alkali-free surfactant having a proportion in the range of 0.005 to 0.5%, based on the volume of the dispersion liquid.

Method for producing a coated quartz glass component

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Seligenstadt, Germany

Gerrit Scheich