Asml Netherlands B.v.

Gerrit Jacobus Hendrik Brussaard

Petrus Wilhelmus Smorenburg

Sander Bas Roobol

David O Dwyer

Sjoerd Nicolaas Lambertus Donders

Vadim Yevgenyevich Banine

Simon Gijsbert Josephus Mathijssen

Andrey Alexandrovich Nikipelov

Nan Lin

Wouter Joep Engelen

Teis Johan Coenen

Krijn Frederik Bustraan

Sudhir Srivastava

Erik Roelof Loopstra

Han-Kwang Nienhuys

Peter Danny Van Voorst

Niels Geypen

Otger Jan Luiten

Willem Jakobus Cornelis Koppert

Gijsbertus Geert Poorter

Ruud Martinus Van Der Horst

Johannes Richard Karl Kohler

Job Beckers

Johannes Richard Karl KÖHLER

A waveguide including: a first section, the first section configured to generate, by a non-linear optical process, a broadened wavelength spectrum of pulsed radiation provided to an input end of the waveguide; a second section, the second section including an output end of the waveguide, the second section configured to exhibit a larger absolute value of group velocity dispersion than the first section; wherein a length of the second section is configured to reduce a peak intensity of one or more peaks in the broadened wavelength spectrum by at least 20%.

Waveguides and manufacturing methods thereof

An illumination source apparatus (), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (); a pump radiation source () operable to emit a beam of pump radiation (); and adjustable transformation optics () configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam () such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (), wherein the location of said outer region is dependent on an adjustment setting of the adjustable transformation optics.

Illumination source for an inspection apparatus, inspection apparatus and inspection method

Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.

High harmonic generation radiation source

A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

Radiation sensor apparatus

A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.

Metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate

Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.

Apparatus for delivering gas and illumination source for generating high harmonic radiation

Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

An electron source, e.g. for a free electron laser used for EUV lithography comprises: &#x2022; a cathode () configured to be connected to a negative potential (); &#x2022; a laser () configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; &#x2022; an RF booster () connected to an RF source and configured to accelerate the bunches of electrons; and &#x2022; a timing corrector () configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode () surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source () configured to apply a correction voltage to the correction electrode.

Electron source for a free electron laser

Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.

Methods and apparatus for optical metrology

Passage through LINACs of electron bunches in their acceleration phase is coordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps: for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is coordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.

Growing community of inventors

Boxtel, Netherlands

Gerrit Jacobus Hendrik Brussaard