U.S. Philips Corporation

Gerrit C Verkade

Sipke Wadman

Maarten H Zonneveld

Jacobus N Dekker

Theodorus J Van Gennip

Adrianus R Engelfriet

Ireneus H Fierkens

In a marking system a pattern of marks present in a mask (30) is transferred to the surface (51) of an object (50) by causing radiation to act on the surface (51) via a mask (30). By adapting the shape and the area of the cross-section of the radiation beam to the pattern to be shown, the pattern is irradiated at a high intensity while the amount of radiation falling outside the pattern is reduced. This is achieved by adapting the cross-section of the beam by means of an exchangeable optical guide and/or cylindrical lenses (21, 22) and/or by stepwise scanning the mask (30) in one or two directions by means of a scanning system (23, 24) while the irradiated parts (I.sub.1, . . . , I.sub.n) overlap each other to a considerable extent.

Device for and method of providing marks on an object by means of

A method and a device for cleaving a plate of a brittle material, such as, for example, glass, by means of a radiation beam repeatedly moving over the plate. The radiation beam is repeatedly passed over a desired track until the plate has been cleaved along a desired line of rupture of the plate.

Method of cleaving a brittle plate and device for carrying out the method

Growing community of inventors

Eindhoven, Netherlands

Gerrit C Verkade