Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Gero Walter

Andreas Schmaunz

Bernd Stenke

Dirk Preikszas

Josef Biberger

Stephan Hiller

Rainer Härle

Gerald Schmid

A gas reservoir that receives a precursor has a gas-receiving unit which is arranged in a first receiving unit of a basic body and a sliding unit which is arranged movably in a second receiving unit of the basic body. The gas-receiving unit has a movable closure unit for opening or closing a gas outlet opening of the gas-receiving unit. In a first position of the sliding unit, a first opening of a sliding-unit line device is fluidically connected to a first basic body opening and a second opening of the sliding-unit line device is fluidically connected to a second basic body opening. In the second position of the sliding unit, the first opening is arranged at an inner wall of the second receiving unit and the second opening is arranged at the movable closure unit.

Gas reservoir, gas feed device having a gas reservoir, and particle beam apparatus having a gas feed device

A method for setting position of a component of a particle beam apparatus may be performed, for example, by the particle beam apparatus. The component may be embodied as a gas feed device, as a particle detector and/or as a beam detector. The method may include: aligning the component with a coincidence point of a particle beam of the particle beam apparatus, determining a rotation angle of a rotation of an object carrier about a rotation axis, loading a position of the component associated with the rotation angle from a database into a control unit, transmitting a control signal from the control unit to a drive unit for moving the component, and moving the component into the position loaded from the database by means of the drive unit, wherein the component arranged in the loaded position is at a pre-definable distance from the object.

Setting position of a particle beam device component

A particle beam apparatus and/or a light microscope is operated. A first temperature of an object may be changed, where the object may be arranged on an object receiving device rendered movable by a motor operated by a supply current. Changing the first temperature of the object may alter a second temperature of the object-receiving device from a first temperature value to a second temperature value. The supply current of the motor may be changed from a first current value to a second current value, where the supply current is designed to hold the object-receiving device in position, and a temperature of the object-receiving device may be changed from the second temperature value to a third temperature value on account of heat generated by the motor, which may be obtained by the second current value of the supply current and fed to the object receiving device.

Operating a particle beam apparatus and/or a light microscope

A method for operating a particle beam apparatus. An objective lens current may be swept, and a property of a deflection unit and/or of an aperture unit may be set while the objective lens current is swept. Setting the property may implemented in such a way that either an image of the object displayed on a display device does not move or any such movement of the displayed image has a minimal deflection. Moreover, the operating voltage of a beam generator may be swept and the object may be aligned by means of a specimen stage. While the operating voltage is swept, the specimen stage may be moved into an aligned position in such a way that either the image of the object displayed on the display device does not move or any such movement of the displayed image has a minimal deflection.

Operating a particle beam apparatus

An object preparation device for preparing an object in a particle beam apparatus includes at least one cutting device, at least one cutting bevel for cutting the object, where the cutting bevel is arranged at the cutting device, at least one movably embodied object receptacle device having an object receptacle for receiving the object, and at least one drive unit for moving the object receptacle device from a first position of the object receptacle device into a second position of the object receptacle device. The first position of the object receptacle device is an initial position. The second position of the object receptacle device is an analysis and/or processing position of the object receptacle device. An observation axis (OA) extends through the object receptacle when the object receptacle device is arranged at the second position.

Object preparation device and particle beam device with an object preparation device and method for operating the particle beam device

A method and a device for determining the distance from the sample to be examined to at least one reference point which function independently of the type of sample. A signal is modulated to a first potential of a sample and a primary particle beam is directed at the sample, resulting in a secondary particle beam being formed by an interaction, the particles of this beam having the modulated signal. The particles of the secondary particle beam and the signal modulated to the potential of the particles of the secondary particle beam are detected. By comparing the detected modulated signal to a reference signal, the distance is determined from the relationship between the reference signal and the detected modulated signal. The device has the corresponding components for implementing the method.

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Westhausen, Germany

Gero Walter