Leybold Aktiengesellschaft

Leybold-Heraeus Gmbh

Leybold-Heraeus Gmbh & Co. Kg

Unaxis Deutschland Holding Gmbh

Gernot Thorn

Friedrich-Werner Thomas

Ewald Benes

Horst Ranke

Albert Feuerstein

Johann Sturmer

Wolfgang Sperzel

Martin Groschl

Guido Hubertus

Horst Schwiecker

Harald Bittenbrunn

Franz Viehbock

Herbert Stori

Paul Berlinger

Johann St&uuml;rmer

Hans-Joachim Siegmund

Michael L&uuml;bbehusen

Michael Schmid

Hans-Peter Ehrl

Dietrich Dahlinger

The invention relates to a device for the prevention of arcing in vacuum sputtering installations. This device comprises a pulse generator which brings the cathode of the sputtering installation at predetermined intervals to a positive potential, whereby a deposing of layers on a target takes place. This deposing prevents the building-up of high voltages which can lead to arcing.

Device for the prevention of arcing in vacuum sputtering installations

The invention concerns apparatus and a process for the non-destructive measurement of the ohmic resistance of thin layers according to the eddy-current principle. Here an inductor (2) is fed with a high frequency voltage (U.sub.osz) and the magnetic field of this inductor (2) is directed at the thin layer to be measured, whereby an eddy current flows in this layer the magnetic field of which weakens the magnetic field of the inductor (2). The inductor (2) is here part of an oscillating circuit (3) which is held always at resonance by means of a phase-correcting arrangement (14). Under these resonance conditions the reactive values of the oscillating circuit (3) may be neglected so that the current flowing into the oscillating circuit (3) depends solely on the ohmic resistance of this oscillating circuit (3), which in turn is determined by the ohmic resistance of the layer to be measured.

Apparatus and process for the non-destructive measurement of the ohmic

The invention relates to a device for recognizing the impact site (29, 37) of a charge carrier beam on a target. This device has two position-sensitive detectors (22, 23) above the target which have a given distance from each other and from the target and on which via imaging systems (24, 25) the impact site (29, 37) of the charge carrier beam is imaged by means of X-rays. The output signals of these detectors (22, 23) are placed on a special evaluation device which determines all three spatial coordinates of the impact site (29, 37) of the charge carrier beam.

Device for recognizing the impact site of a charge carrier beam on a

A device and a method for the control and monitoring of a deflectable electron beam is provided for the working of metal wherein the electron beam is not permitted to go beyond an allowed working area. With this device with the aid of a Teach-In method the limits are entered into a computer. The computer generates an image of the areas allowed for the electron beam in a particular area of a special memory. This memory is so organized that the addresses of the point of the particular areas correspond to the digitized coordinates of the point of impingement of the electron beam. The characterization of the allowed and forbidden target points of the electron beam takes place through placing or deleting respectively the assigned bits in the special memories.

Device and method for the control and monitoring of an electron beam for

The invention concerns apparatus for the non-destructive measurement of the ohmic resistance of thin layers. The apparatus is based on a capacitative measurement process wherein the plates of a capacitor are formed by an electrode (3) with the thin layer (6) to be measured, the dielectric of the capacitor being constituted by a carrier foil (5) on which the thin layer (6) is carried, for instance by means of a vacuum-depositing process. The electrode (3) is supplied via an oscillator with high-frequency voltage (U.sub.HF) so that a displacement current flows from the electrode (3) over the carrier foil (5) to the thin layer (6) and from there back again. This displacement current is composed of an ohmic part and a capacitive part. In order to maintain the capacitative part constant even for fluctuating capacitances, caused e.g. by changes in the thickness of the carrier foil (5), an additional capacitor is connected in a regulated manner to the capacitor that is present.

Apparatus for the non-destructive measurement of the ohmic resistance of

The invention concerns a circuit arrangement for the combined application of an inductive and capacitative device (2, 3) for the non-destructive measurement of the ohmic resistance of thin layers. Such thin layers are, for instance, produced in high vacuum technology by evaporation. The inductive and capacitative devices (2, 3) are disposed in the immediate vicinity of the layer to be measured and are fed with a high-frequency voltage U.sub.HF. Since the inductive device (2, 3) has an oscillating circuit (4, 5) which is always continuously tuned to resonance, one is concerned with currents which flow both into the capacitative and the inductive devices (2, 3) and which are proportional to the conductivity of the layer to be measured. By evaluating these currents for which, according to the invention, the same circuity may be used, it becomes possible to make inferences about the surface resistance of the thin layer.

Circuit arrangement for the combined application of an inductive and

The invention concerns apparatus for detecting the position of incidence (2) of a beam (1) of charge carriers on a target (3) wherein X-rays (4) starting from the position of incidence (2) are detected by detector (7) connected to an analyzing circuit (9) An imaging system (5, 50; 10, 11, 12) is provided which can cover all the positions (P.sub.1 . . . P.sub.8) that the positions of incidence (2) can take up and projects them on the sensing surface of a position-sensitive detector (7), wherein the projected coordinates (x', y') are directly proportional to the coordinates (x, y) of the position of incidence (2). In addition, a filter (6) highly transparent to the X-ray radiation range emitted from the position of incidence (2) is arranged between the target surface (3) and the position-sensitive sensor (7). The position-sensitive detector (7) emits electric signals which depend from the coordinates (x, y) of the position of incidence (FIG. 1).

Apparatus for detecting the position of incidence of a beam of charge

The invention relates to a system for determining the current thickness of changing coatings of a material on a substrate, using an electrically excitable, mechanically vibratable element (2) having at least one pronounced resonant frequency, which is excited to a steady vibration by an oscillator circuit (1) at a resonant frequency, and which is covered by the material in the same manner as the substrate. A signal (U.sub.D) is produced which depends on the damping caused by the coating of the vibratable element (2). This signal (U.sub.D) is compared with a known critical value signal (U.sub.DE) whereby it is possible to indicate when the vibratable element (2), which can be coated with the material only to a certain degree, must be replaced with a new vibratable element (FIG. 2).

System for determining the thickness of varying material coatings

The invention concerns a converter (2) provided with GTO thyristors the frequency and characteristic shape of its output voltage (U.sub.A) being constrained by a load (3). The frequency of the converter (2) is matched to the constrained output voltage (U.sub.A) with the aid of a regulating circuit (4). Non-simultaneously switched GTO thyristors are switched on and off in a predetermined timed relation to each other (FIG. 3).

Direct-current-alternating-current inverter comprising a load which

Arrangement for electrically measuring coating thickness on travelling webs in vacuum deposition apparatus. A plurality of sensors are arranged with respect to a roller around which the web runs each with a spatially limited measuring region. These produce signals which represent a measure for the coating thickness. The signals can be indicated by an evaluating circuit. To avoid a falsification of the measuring signals as a result of the tendency of the travelling web to flutter, according to the invention the sensors (3,4,5) are arranged in the roller (1) against its surface and are distributed lengthwise of the roller. The sensors are connected to the evaluating circuit (7) by a transfer device (28). Preferably, the sensors rotate with the roller.

Apparatus for electrically contactlessly measuring the thickness of

A method and system for a vacuum-evaporative film-deposition process displays bar charts of the local evaporation power of each vapor source in the process and the film thickness deposited thereby in spatial coordination on a single display screen.

Method and system for a vacuum evaporative deposition process

An arrangement and photometer for measuring and controlling the thickness of optically active thin layers wherein the axis of the measurement light beam coming from the measurement light source is directed to the measurement object and a referenced light receiver, independent of the optical properties of the measurement object, is associated with the measurement light beam. The output signal of the referenced light receiver is mixed with a trigger stage for a phase sensitive photometer amplifier and is fed to a compensation circuit for the equilization of brightness variations in the measurement light source.

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Hanau, Germany

Gernot Thorn