Toppan Printing Co., Ltd.

Leybold Aktiengesellschaft

Balzers Und Leybold Deutschland Holding

Applied Materials Gmbh & Co Kg

Gerhard Steiniger

Mitsuru Kano

Thomas Krug

Mamoru Sekiguchi

Andreas Meier

Takashi Miyamoto

Noboru Sasaki

Klemens Ruebsam

Joachim Szczyrbowski

Mika Gamo

Helmut Grimm

Gotz Teschner

Nobuhiko Imai

Hiroyuki Yasujima

A crucible (4) in a vacuum chamber (3) holds material to be evaporated, such as a metal or metal oxide or a mixture of a metal and a metal oxide, and a coating roll (6) guides a film web (8) a certain distance away from the material to be evaporated. A chamber (9, 10) is provided on each side of the coating roll (6) which carries the film web (8) past the crucible (4), a magnetron cathode (11, 12) connected to a medium-frequency source (19) being provided in each chamber. Each of the two chambers (9, 10) is connected by its own channel (13, 14) to a coating zone (20) directly between the coating roll (6) and the crucible (4), and each chamber (9, 10) is connected by a pressure line (21, 22) to a source (23, 24) of process gas.

Apparatus for coating a web on a rotating drum by plasma assisted vapor

This invention relates to a source material for vapor deposition, which is useful for forming a magnesium oxide thin film by vacuum vapor deposition process, and to a method of forming a transparent barrier film by using the magnesium oxide source material. The source material is composed of a magnesium oxide having a bulk density of 2.5 g/ml or more. This magnesium oxide can be obtained by sintering or fusing magnesium oxide material. For producing a transparent barrier film having a gas barrier property, this magnesium oxide is vapor-deposited on a surface of a transparent plastic base film by means of vacuum vapor deposition. The volume shrinkage or cracking of the evaporation source material can be avoided, thereby stabilizing the evaporation and prolonging duration of the evaporation. Further, it is possible to utilize a high power of electron beam. Since the evaporation source material is substantially free from pore, the evacuation of gas from the evaporation apparatus can be finished within a short period of time, and the vacuum degree within the evaporation apparatus can be stabilized. Since there is no splash or scattering during the evaporation., a transparent barrier film which is uniform in thickness and free from pinhole can be obtained.

Evaporation method of forming transparent barrier film

The invention relates to a vacuum coating installation comprising a container (9) in which is disposed the material (10) to be vaporized, for example SiO. The vaporization of the material (10) herein takes place by means of an electron beam gun (11) or by means of a vaporization oven. Opposing the surface of the material to be vaporized (10) is provided a synthetic film (5) to be coated which is transported further by means of a transport arrangement (4, 6, 22 to 27). Into the space between the material (10) to be vaporized and the material (5) to be coated a microwave is irradiated from an horn antenna (13).

Vacuum coating installation

The invention relates to a method for the aftertreatment of an oxide coating, and specifically an SiO.sub.x coating on a synthetic film. In this aftertreatment the oxide coating is exposed to a plasma whose particles effect positive changes of the oxide coating.

Method for treating an oxide coating

Growing community of inventors

Ronneburg, Germany

Gerhard Steiniger