American Air Liquide, Inc.

Liquid Air Corporation

American Air Liquide, Chicago Research Center

Gerhard Kasper

Yao-En Li

John Rizos

Horng-Yuan Wen

Hwa-Chi Wang

Gary Schmitt

Joe Ritrosi

Carl Quintino

Donnel Montgomery

Horng Y Wen

HorngYuan Wen

Yukinobu Nishikawa

Donell Montgomery

A method and system for purging an ultra-high purity gas supply manifold comprising: a process connection through which ultra-high purity gas is communicated to a process; a first pigtail conduit in selective flow communication with a high purity gas source; a second pigtail conduit in selective flow communication with said process connection; means for creating a vacuum and means for selectively placing said vacuum means in communication with said first pigtail; an ultra-high purity process gas source; a block valve assembly comprising an inlet port in flow communication with said process gas source, a first outlet port in selective communication with said purge gas supply through connection with said first pigtail and second outlet port in selective communication with said process connection through connection with said second pigtail.

Purgeable connection for gas supply cabinet

A process for passivating a metal surface to enhance the stability of a gas mixture containing one or more gaseous hydrides in low concentration in contact therewith, which comprises:

Process for passivating metal surfaces to enhance the stability of

A process for drying a metal surface to enhance the stability of a gas mixture containing one or more gaseous hydrides in low concentration in contact therewith, which comprises: a) purging gas in contact with the metal surface with inert gas to remove the purged gas, b) exposing the metal surface to an amount of a drying agent comprising an effective amount of gaseous hydride of silicon, germanium, tin or lead, and for a time sufficient to dry the metal surface, and c) purging the drying agent using inert gas.

Process for drying metal surfaces using gaseous hydrides to inhibit

A method to detect, measure or remove trace amounts of condensible vapors in compressed gases. The concentration of droplets detected, measured or removed may be as low as part per trillion. The compressed gas comprising a carrier gas and condensible vapors is discharged through a critical orifice in order to condense the vapors in the form of homogeneous droplets. The droplets are either detected, or their concentration measured or removed from the expanded carrier gas.

Method of detecting and or removing trace amounts of condensible vapors

Disclosed is a device for particle sampling from compressed gases. The device allows for anayzing particles from compressed gases of a pressure ranging from 20 psi to 3000 psi. In the device, the formula D.sub.s =D.sub.t .sqroot.(Q.sub.s /Q.sub.t) is applicable wherein D.sub.s and D.sub.t are the probe diameter and the chamber diameter, respectively, Q.sub.s is the sampling flow rate required by monitoring instruments, and Q.sub.t is the total flow rate determined by the orifice diameter and pressure whereby the sampling velocity substantially matches the local flow velocity at the probe. In addition, a distance between the orifice and the probe is greater than L wherein L=D.sub.c / (2 tan .alpha.) where D.sub.c is the chamber diameter and .alpha. is the half angle of jet expansion.

Pressure reduction device for particle sampling from compressed gases

A method is disclosed which avoids the formation of droplets by condensation of vapors during the expansion of a highly compressed gas through a critical orifice. The pressure drop is distributed over a sufficient number of critical orifices so as to limit the temperature drop insufficient to initiate droplet formation. One application of the method is pressure reduction of cylinder gases without droplet formation.

Method for reducing pressure of highly compressed gases without

Method and apparatus for the measurement of sub-ppm concentrations of impurities in liquids. The liquid to be measured for impurities is dispersed into uniform droplets of a precisely known diameter D in a gas stream, such as air, using for example, a vibratory orifice generator. The dispersed droplets evaporate in the gas stream to leave a residue particle having a diameter d, which can be measured for example by means of a laser light scattering spectrometer. The concentration by volume, C.sub.v, of the impurities can then be calculated according to the equation; C.sub.v =(d/D).sup.3.

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Downers Grove, IL, United States of America

Gerhard Kasper