International Business Machines Corporation

Kyndryl, Inc.

Gerhard Ingmar Meijer

Chung H Lam

Siegfried Friedrich Karg

Johannes Georg Bednorz

Peter Willem Jan Staar

Valery Weber

Alejandro Gabriel Schrott

David V Horak

Steven J Holmes

Mark Charles Hakey

Charles W Koburger, Iii

Toshijaru Furukawa

Eric Andrew Joseph

Rolf Allenspach

Daniel Widmer

Richard Stutz

Matthew Joseph Breitwisch

Eric Alan Eckberg

Walter Heinrich Riess

Matthew Allen Butterbaugh

Roger W Cheek

Gerd Schlottig

Raymond Floyd Babcock

David R Motschman

Hon-Sum Phillip Wong

David J Gundlach

Paul Andrew Moskowitz

John Kenneth DeBrosse

Jonathan Zanhong Sun

Heike E Riel

Mark Edward Steinke

Derek Ian Schmidt

James Scott Womble

Michele Dolfi

Thilo Hermann Curt Stoeferle

Maksym Lysak

Nikolaos Livathinos

Ahmed Samy Nassar

Santos F Alvarado

Thilo H Stöferle

Lokesh Mishra

Paramita Chakraborty

Antony Pulicken

Thilo Eermann Curt Stöferle

Thilo H C Stöferle

Georg Bednorz

The invention is notably directed to a computer-implemented method to generate a synthetic data set. The synthetic data set comprises a plurality of chemical documents and each of the plurality of chemical documents comprises a respective set of chemical objects. The method comprises a step of receiving configuration data, the configuration data comprising a set of configuration parameters for the data set. The method further comprises performing, in an iterative manner, for each of the plurality of chemical documents the steps of generating, by a structure generation module, a respective document structure for each of the respective chemical documents in accordance with the configuration data, generating, by a content generation module, the respective set of chemical objects for the respective chemical document and arranging the respective set of chemical objects on the respective chemical document.

Synthetic data set generation of chemical illustrations

A method includes: integrating, by the computing device, a combination of user identified parameters in a template-based framework with historical operations data of a plurality of data centers in a multiple data center set-up to produce a feature set of parameters; clustering, by the computing device, the exclusive feature set of parameters into an optimal number of groups, each of which comprise similar physical attributes of chillers associated with any of the plurality of data centers; generating, by the computing device, analytical models for data center infrastructure component energy efficiency optimization of the multiple data center set-up based on the optimal number of groups; and providing recommendations from the analytical models as to which parameters are to be adjusted to have a more efficient energy utilization of the data center infrastructure components.

Optimizing chiller energy efficiency in a multiple data center set-up

A photoacid generator (PAG) anion, a photoresist composition, and a method are disclosed. The PAG anion includes a moiety, selected from an alkyl group, a monocyclic aromatic group, and a bicyclic aromatic group, that includes a carbon atom with a negative elementary charge. The PAG anion also includes an electron acceptor atom, selected from boron(III), aluminum(III), and phosphorus(V), which is covalently bonded to the carbon atom. The PAG anion also has at least one electron-withdrawing R group. The photoresist composition has a PAG that includes the PAG anion and a cation selected from triphenylsulfonium, diphenyliodonium, phenylthiolanium, and derivatives thereof. The method includes forming a layer of the photoresist composition over a material surface on a substrate, irradiating the layer to form a pattern of radiation-exposed regions, selectively removing portions of the irradiated layer to form exposed portions of the material surface, and etching or ion implanting the exposed portions.

Photoacid generator for chemically amplified photoresists for deep ultra violet and extreme ultraviolet lithography

In an approach to improve the field of photoacid generators (PAGs) through a new photoacid generator, in particular to a photoacid generator comprising a new polycyclic aromatic photoacid generator compound anion, and a photoresist composition, comprising said photoacid generator. Embodiments the present invention relate to a method of generating an acid using said photoresist composition and a method of forming a patterned materials feature on a substrate.

Photoacid generator for chemically amplified photoresists

Provided are techniques for performing a search using a hypergraph. Entities are identified. A knowledge graph using the entities is generated, wherein nodes of the knowledge graph represent the entities and edges between the nodes represent pair-wise relationships, and wherein each of the edges carries an edge score that quantifies a degree of coherence between a pair of the entities. A hypergraph using the knowledge graph is generated, wherein nodes of the hypergraph represent the entities and hyperedges represent relationships between multiple entities, and wherein each of the hyperedges carries a hyperedge score that quantifies a degree of coherence between the multiple entities. A search request is received. A search result is generated using the hypergraph, wherein the search result comprises a set of coherently related entities. The search result is returned.

Performing a search using a hypergraph

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10·cm/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

Photoacid generator

Organometallic photoresists suitable for use in deep ultraviolet (DUV) or extreme ultraviolet (EUV) lithography are provided. The organometallic photoresists contain an organometallic molecule having least a metal element M selected from the group consisting of Bi, Sb, and mixtures thereof, and having an oxidation state of 3+, and at least one polymerizable group R. A method of forming a patterned materials feature on a substrate utilizing the organometallic photoresist compositions is also provided.

Organometallic photoresists for DUV or EUV lithography

A device includes at least one tunable resistive element. Each tunable resistive element comprises a first terminal, a second terminal, and a dielectric layer arranged between the first and second terminals. The device is configured to apply at least one electrical set pulse to the resistive elements to form a conductive filament comprising a plurality of oxygen vacancies in the dielectric layer. The device is configured to apply at least one electrical reset pulse to displace a subset of the oxygen vacancies of the conductive filament. The at least one electrical reset pulse comprises a first part, which is adapted to increase the temperature of the conductive filament and increase the mobility of the oxygen vacancies of the conductive filament, and a second part, which is configured to displace the subset of the oxygen vacancies of the conductive filament.

Device comprising tunable resistive elements

A heat removal element comprises a deformable frame, having a first coefficient of thermal expansion. The frame includes a set of separate cavities formed in the frame, the set including a first cavity and a second cavity; and on one side of the first cavity, a deformable wall adapted to provide mechanical compliance with a heat source for transferring heat away from the heat source. The second cavity comprises a material that fills, at least partly, the second cavity, this material having a second coefficient of thermal expansion that differs from the first coefficient of thermal expansion.

Heat removal element with thermal expansion coefficient mismatch

A compliant heat sink for transporting heat away from at least one electronic component, the heat sink includes a body, where the body includes a flexible element thermally contacting at least one electronic component. The heat sink further includes a cavity located in the body, where the cavity is at least partially covered by the flexible element. The heat sink further includes a raised member of the body coupled to the flexible element, where a portion of the raised member partially extends into the cavity. The heat sink further includes a guiding structure of the body coupled in the cavity of the body, wherein the guiding structure is adapted for guiding the movement of the raised member in a moving direction.

Compliant heat sink

A heat exchanger includes a flat metal tube that has flat top and bottom surfaces and an inner passage. The surfaces remove heat from a liquid passing through the passage from an inlet and toward an outlet of the heat exchanger. A first plurality of solid metal posts are mounted perpendicularly upon the top surface. Each fin of a first plurality of fins has holes fitted about the first plurality of posts such that the fins are mounted on the posts in vertically-spaced, parallel alignment relative to each other and the top surface. A second plurality of solid metal posts are mounted perpendicularly upon the bottom surface. Each fin of a second plurality of fins has holes fitted about the second plurality of posts such that the fins are mounted on the posts in vertically-spaced, parallel alignment relative to each other and the bottom surface.

Heat exchangers for cooling integrated circuits

A system includes an integrated circuit and a heatsink mounted thereon. The heatsink includes a flat base plate thermally coupled to a top surface of the integrated circuit, thermally-conductive solid metal posts mounted perpendicularly on the base plate, and flat metal fins. Each of the fins has holes fitted about the posts such that the fins are mounted on the posts in vertically-spaced, parallel alignment relative to each other and the top surface of the base plate. The system further includes a load plate mounted upon top surfaces of the posts, a printed circuit board, and a microprocessor socket mounted on the printed circuit board. The microprocessor socket includes a socket base upon which the integrated circuit is mounted such that the integrated circuit is electrically coupled through the socket base to the printed circuit board. Air may be forced through the heatsink.

Air-cooled heatsink for cooling integrated circuits

Each pair of memory modules in a memory system are cooled using a shared cooling pipe, such as a heat pipe or liquid flow pipe. An example embodiment includes one pair of memory module sockets on opposite sides of the respective cooling pipe. An inner heat spreader plate is thermally coupled to the cooling pipe and in thermal engagement with a first face of the memory module adjacent to the included cooling pipe. Heat is conducted from the second face of the memory module to the cooling pipe, such as from an outer plate in thermal engagement with an opposing second face of the memory modules and with the inner plate.

Liquid-cooled memory system having one cooling pipe per pair of DIMMs

A multi-terminal programmable element. The programmable element includes a source electrode and a drain electrode on a base. The programmable element includes reference voltage contact that is not in contact with the source or drain electrode. The base includes a transition-metal oxide with oxygen vacancies for drifting under an applied electric field. Further, materials of the source electrode and the base are selected such that an interface of a source and/or drain electrode material and the transition metal oxide base material forms an energy barrier for electron injection from the electrode into the base material. The energy barrier has a height that depends on an oxygen vacancy concentration of the base material. Four non-volatile states are programmable into the programmable element.

Programmable element, and memory device or logic circuit

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Zurich, Switzerland

Gerhard Ingmar Meijer