Carl Zeiss Smt Gmbh

Gerhard Focht

Toralf Gruner

Markus Hauf

Jochen Weber

Ulrich Schoenhoff

Arif Kazi

Payam Tayebati

Michael Thier

Ole Fluegge

Alexander Sauerhoefer

Eric Eva

Aksel Goehnermeier

Dirk Hellweg

Tilmann Heil

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Optical element and method

The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.

Optical correction device

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Wilmsdorf, Germany

Gerhard Focht