Ams Ag

Gerhard Eilmsteiner

Jens Hofrichter

Hannes Brandner

Desislava Oppel

Matt Kroese

Deborah Morecroft

Primoz Kusar

Josef Kriebernegg

David Josef Pramberger-Schriebl

An optical device includes an emitter operable to emit a first light wave. The optical device also includes a detector operable to detect a second light wave that is based on the first light wave. The second light wave is susceptible to being coupled with an undesired light wave that is based on the first light wave. The optical device further includes an interference filter disposed on the detector. The interference filter includes a first filter portion and a second filter portion having a first set of layers formed from a first material and a second set of layers formed from a second, different material. The interference filter is operable to attenuate undesired light waves in multiple distinct environments based on the first and second sets of layers in the second filter portion.

Optical interference filters

Forming a three-dimensional structure includes applying photoresist on a layer and using a photolithography system to expose the photoresist. The photolithography system includes a photomask having a pattern thereon, where the pattern provides varying pattern density across a surface of the photomask and has a pitch that is less than a resolution of the photolithography system. The method includes subsequently developing the photoresist such that photoresist remaining on the layer has a three-dimensional profile defined by the photomask. An isotropic etchant is used to etch the layer such that the three-dimensional profile of the photoresist is transferred to the layer.

Formation of three-dimensional structures using grey-scale photolithography

A filter assembly includes an incident medium, a spacer, at least one dielectric filter and an exit medium. The spacer is arranged between the incident medium and the at least one dielectric filter such that the incident medium and the at least one dielectric filter are spaced apart by a working distance and thereby enclose a medium of lower index of refraction than the incident medium. The at least one dielectric filter is arranged on the exit medium.

Filter assembly, detector, and method of manufacture of a filter assembly

An optical device () includes an internal cavity and an emitter () disposed in the internal cavity (). The emitter is operable to emit a first light wave (). The optical device also includes a detector () disposed in the internal cavity. The detector is operable to detect a second light wave () that is based on the first light wave. The second light wave is susceptible to being coupled with an undesired light wave () that is based on the first light wave. The optical device further includes an interference filter () disposed on the detector. The interference filter has a filter property that causes the interference filter to attenuate the interfering light wave.

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Eindhoven, Netherlands

Gerhard Eilmsteiner