Hoechst Aktiengesellschaft

Agfa-gevaert Ag

Clariant Corporation

Hoeschst Aktiengesellschaft

Gerhard Buhr

Mathias Eichhorn

Hans Ruckert

Siegfried Scheler

Wolfgang Zahn

Stephan J Platzer

Klaus Bergmann

Dieter Mohr

Andreas Elsaesser

Hartmut Steppan

Hans W Frass

Jurgen Sander

Andrea Buchmann

Wojciech A Wilczak

Hans-Joachim Merrem

Juergen Fuchs

Peter Wilharm

Axel Schmitt

Ruediger Lenz

Georg Pawlowski

Ernst I Leupold

Paul Stahlhofen

Horst Roeschert

Walter Spiess

Detlef H Skaletz

Herbert Siegel

Gerhard Lohaus

Gerhard Sprintschnik

Otfried Gaschler

Fritz Erdmann

Rudolf Neubauer

Bernd Hupfer

Charlotte Eckes

Manfred Michel

Horst Wengenroth

Klaus-Peter Bergmann

Siegfried Scheler, Deceased

Marie-Luise Geus

Helmut Lenz

Andreas Elsaessser

A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

Radiation-sensitive mixture

The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and III

Positive-working radiation-sensitive mixture

Compounds of the formula ##STR1## are suitable as photoinitiators in free-radical-polymerizable mixtures and are notable for a reduced tendency to diffusion and sublimation than comparable known compounds.

2-acylamino-9-arylacridines, process for their preparation and

The invention relates to aromatic or heteroaromatic mono- or bis-diazonium 1,1,2,3,3,3-hexafluoro-propanesulfonates. They are employed in positive-working or negative-working radiation-sensitive mixtures which are used for coating radiation-sensitive recording material.

Aromatic hexafluoropropanesulfonate diazonium salts and their use in

A positive-working recording material is disclosed that has an aluminum base and a mat-finished radiation-sensitive layer that contains a 1,2-naphthoquinone-2-diazide as radiation-sensitive compound and a binder which is insoluble in water but soluble or swellable in aqueous alkali. The radiation-sensitive 1,2-naphthoquinone-2-diazide is an ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a phenolic compound that contains at least 2, preferably at least 3, phenolic hydroxyl groups, which ester has a phenolic hydroxyl group content of at least 0.5 mmol/g and a diazo unit content of at least 1.5 mmol/g. The binder is a phenol/formaldehyde novolak that contains at least 5 mmol/g phenolic hydroxyl groups, the phenol component of which contains at least 30 mol percent m-cresol and at least 10 mol percent of at least one xylenol and which has a weight-average M.sub.w of 2,000 to 12,000 (determined by means of GPC with polystyrene as standard). The radiation-sensitive layer additionally contains at least one phenolic additive which has a molecular weight M.sub.w of not more than 600 and contains 2 to 4 uncondensed phenyl nuclei and at least 6 mmol/g phenolic hydroxyl groups.

Positive-working recording material containing aluminum base and

A photosensitive material for the production of color proofing films for multicolor printing, having

Process for the production of a multicolored image and photosensitive

The invention relates to N,N-disubstituted sulfonamides of the formulae R.sup.1 [--N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 ].sub.n (I) and R.sup.1 [--SO.sub.2 --N(CO--OR.sup.2)--R.sup.3 ].sub.n (II), in which R.sup.1 --for n=1--is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14) aryl or (C.sub.7 -C.sub.20)aralkyl radial, for n&gt;1--the 2-, 3- or 4-valent radical of a (C.sub.1 -C.sub.20)alkane or (C.sub.6 -C.sub.7)cycloalkane, a non-condensed or condensed mono- or polynuclear (C.sub.6 -C.sub.18)aromatic compound, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11)alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical. The invention further relates to a positive radiation-sensitive mixture containing a) a compound which under the influence of actinic radiation forms acid, b) an acid-cleavable compound whose cleavage products in an aqueous alkaline developer have a higher solubility than the starting compound, and c) a polymeric binder which is insoluble in water but is soluble or at least swellable in aqueous alkaline solutions, in which the compound b) is a sulfonamide of the formula I or II. The mixture according to the invention is particularly suitable for the manufacture of offset printing plates and photoresists.

N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared

The invention relates to 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl- or -isopropylbenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid, a radiation-sensitive mixture prepared therewith, and a radiation-sensitive recording material comprising a substrate and a radiation-sensitive layer which is composed of the mixture according to the invention.

(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive

A photosensitive material comprising (A) a flexible transparent film support, (B) a colored photosensitive layer which contains an organic binder (B1) a dye or a colored pigment (B2), a compound (B3), which forms a strong acid on exposure to radiation, and a compound (B4) which has at least one group cleavable by the acid, and (C) an adhesion-promoting layer which contains a thermoplastic polymer which has a softening temperature in the range from 40.degree. to 200.degree. C., wherein the adhesion (a.sub.1) of the unexposed photosensitive layer (B) to the adhesion-promoting layer (C) is less than the adhesion (a.sub.3) of the unexposed photosensitive layer (B) to the film support (A) and than the cohesions of the layers (B) and (C), and the adhesion (a.sub.3 ') of the exposed photosensitive layer (B) to the film support (A) is less than the adhesion (a.sub.1 ') of the exposed photosensitive layer (B) to the adhesion-promoting layer (C) and than the cohesions of the adhesion-promoting layer (C) and of the exposed photosensitive layer (B) is useful for the production of a colored image, in particular, is useful in a color proofing method for multicolor printing, which process gives images having high resolution.

Peel-apart process for the production of a colored image and imaged

Photosensitive material for the production of a colored image utilizing

The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.1 (II), and to a radiation-sensitive mixture which contains: a) a compound which under the influence of actinic radiation forms acid, and b) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound, in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

Polymers having N,N-disubstituted sulfonamide pendent groups and use

Positive-acting radiation-sensitive mixture and recording material

Growing community of inventors

Koenigstein, Germany

Gerhard Buhr