Infineon Technologies Ag

Qimonda Ag

Gerd Unger

Rainer Pforr

Mario Hennig

Wolfgang Besenböck

Andreas Oelmann

Gernot Gödl

Alois Reiter

A layout is decomposed into partial patterns. An intermediate mask is drawn for each of the partial patterns. The intermediate masks are used in a mask stepper or scanner progressively for projection again into a common pattern on a test mask. A line width distribution LB(x,y) is determined from the test mask or from a test wafer exposed using the mask, and is converted into a distribution of dose corrections. The transmission T(x,y) of the respective intermediate masks is adapted based upon the calculated dose correction. This can be achieved using additional optical elements which are assigned to the intermediate masks and have shading structure elements, or by laser-induced rear-side introduction of shading elements in the quartz substrate of the intermediate masks themselves.

Method for producing a mask for the lithographic projection of a pattern onto a substrate

A retaining device for photo blanks, comprising a retaining member () with a supporting surface () for a photo blank () and a ground element () which can be brought into contact with an electroconductive layer () of said photo blank. The ground element is provided with a contact tip () which can be manipulated in such a way that it can be lowered substantially onto the photo blank () without any lateral movement in relation to said photo blank which is inserted into the retaining device.

Method of grounding a photoblank to a holding device

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Munich, Germany

Gerd Unger