Praxair Technology, Inc.

H.c. Starck Gmbh

Taniobis Gmbh

H.c. Starck Clevios Gmbh

Gerd Passing

Knud Reuter

Lothar Puppe

Stephan Kirchmeyer

Thomas J Hunt

Christoph Schnitter

Irina Belov

Holger Brumm

Tomasz Kupka

Kim Younsoo

Roland A Fischer

Parala Harish

A tungsten(VI) oxytetrachloride having a chemical purity of greater than 99.95%. The tungsten(VI) oxytetrachloride has a fraction of compounds selected from WCl, WOCl, WOand WO, as defined as a ratio of a reflection having a highest intensity of one of WCl, WOCl, WOand WO, (I(P2)100) in an x-ray diffraction pattern to a reflection having a highest intensity of the tungsten(VI) oxytetrachloride (I(WOCl)100) in the x-ray diffraction pattern, expressed as I(P2)100/I(WOCl)100, of less than 0.03.

High-purity tungsten(VI) oxytetrachloride and process for preparing same

The present invention provides a new process for separating zirconium and hafnium compounds, in particular to remove traces of zirconium compounds from hafnium compounds, using fractional crystallisation, as well as hafnium compounds obtainable in accordance with this process.

Process for separating zirconium and hafnium

Provided is a novel high selectivity aqueous slurry composition method of utilizing same. The composition includes non-modified silica based abrasive particles in an amount of about 5 to about 50 weight percent, and an organic compound in an amount of about 0.001 to about 2.0 weight percent in an aqueous solution, wherein the silicon oxide to silicon nitride selectivity ratio ranges from about 50 to about 700.

High selectivity colloidal silica slurry

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Hürth, Germany

Gerd Passing