Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Carl-zeiss-stiftung

Leo Elektronenmikroskopie Gmbh

Max-planck-gesellschaft Zur F&#xf6;rderung Der Wissenschaften E. V.

Carl Zeizz Nts Gmbh

Tescan Brno, S.r.o.

Tescan Tempe, LLC

Gerd Ludwig Benner

Marko Matijevic

Dirk Zeidler

Harald Rose

Thomas Kemen

Rasmus Schröder

Bastian Barton

Christof Riedesel

Volker Drexel

Joerg Jacobi

Ingo Mueller

Arne Thoma

Markus Doering

Juergen Kynast

Dirk Preikszas

Erik Essers

Eugen Weimer

Johannes Bihr

Stefan Meyer

Martin Ross-Messemer

Harald Niebel

Jon Karl Weiss

Matthias Langer

Pascal Anger

Stephan Kujawa

Stanislav Petras

Nicole Bengesser

Bohumila Lencova

Steffen Niederberger

Nicole Rauwolf

Josef Frey

Bohumila Lencová

A method for automatically aligning a scanning tunneling electron microscope (STEM) for acquiring precession electron diffraction (PED) mapping data includes the generation of an incident electron beam aligned with a STEM optic axis and focused on a sample region. A non-inclined signal is acquired of the spatial distribution from the sample region, by scanning the aligned incident beam across multiple discrete locations and acquiring a signal associated with each location. The method can further include the inclination of the incident electron beam to a fixed inclination angle relative to the optic axis and then acquiring an inclined signal spatial distribution from the sample region by scanning the inclined incident beam across the multiple discrete locations while applying a cyclic azimuthal scanning protocol to the inclined beam and acquiring a signal associated with each location. An azimuthal spatial alignment correction is determined by comparing the non-inclined and inclined signal spatial distributions.

Method for automatically aligning a scanning transmission electron microscope for precession electron diffraction data mapping

A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.

Particle beam system and method for operating a particle optical unit

An electron microscope includes an electron beam source, a first electromagnet, a second electromagnet and a detector. The field generated by the first electromagnet has an effect of three lenses subsequently arranged along the beam path. A first lens of these lenses is arranged upstream of the object plane and focuses the beam at the object plane. The second lens of these three lenses is arranged downstream of the object plane. The third lens of these three lenses generates an image of a diffraction plane of the second lens at the detector. The magnetic field generated by the second electromagnet has an effect of a fourth lens and can be changed in order to change a size of the image of the diffraction plane of the second lens on the detector.

Electron microscope

A particle optical system comprises a beam generating system () configured to generate a plurality of particle beams () and to direct the plurality of particle beams () onto an object plane (), a first deflector arrangement () arranged in the beam path of the particle beams () upstream of the object plane () and configured to deflect the plurality of particle beams () before they are incident on the object plane (), an object holder () configured to hold an object () to be inspected in the object plane (), a plurality of detectors () configured to receive and to detect the plurality of particle beams () having traversed the object plane (), wherein the detectors are arranged in a detection plane () on a side of the object plane () opposite to the beam generating system (), at least one first particle optical lens () configured to collect particles of the particle beams emanating from the object plane on the detectors (), and a controller () configured to control the first deflector arrangement () in order to deflect locations of incidence () of the particle beams () on the object plane () by deflecting the particle beams ().

Particle optical system

A transmission electron microscopy system has an illumination system and an objective lens system. A first projection system images the diffraction plane of the objective lens system into a first intermediate diffraction plane. A second projection system images the first intermediate diffraction plane into a second intermediate diffraction plane. A first aperture located in the first intermediate diffraction plane has a central opening of a first radius. A bright field detector located in the second intermediate diffraction plane has a detection surface defined by an inner edge of a second radius. The first radius and the second radius define a maximum angle and a minimum angle, respectively, relative to the optical axis of directions of bright field electrons traversing the sample plane and detectable by the bright field detector.

Transmission electron microscopy system and method of operating a transmission electron microscopy system

A transmission electron microscope in which a sample is positioned in a sample planecomprises an objective lens, a first projection lens systemhaving plural lenses, a second projection lenssystem having plural lenses, and an analyzing system. The sample planeis imaged into an intermediate image plane, a diffraction planeof the objective lensis imaged into an intermediate diffraction plane, and either

Transmission electron microscope

A charged particle beam system for performing precession diffraction includes a lensfor focusing a beamin an object plane, and an objective lenshaving a diffraction plane. A doubletof lensesimages the diffraction planeinto an intermediate diffraction planewhere a multipoleis located. A doubletof lensesimages the intermediate diffraction planeinto an intermediate diffraction planewhere a multipoleis located. A first deflection systemupstream of the object planecan tilt to change an angle of incidence of the beam on the object plane. A second deflection systembetween lensesandtilts the beam such that the change of the angle of incidence of the charged particle beam on the object plane is compensated.

Precession diffraction charged particle beam system

A particle beam microscope comprises a magnetic lenshaving an optical axisand a pole piece. An objectto be examined is mounted at a point of intersectionbetween an optical axisand the object plane. First and second X-ray detectorshave first and second radiation-sensitive substratesarranged such that a first elevation angle &#x3b2;between a first straight lineextending through the point of intersectionand a center of the first substrateand the object planediffers from a second elevation angle &#x3b2;between a second straight lineextending through the point of intersectionand a center of the second substrateand the object planeby more than 14&#xb0;.

Particle beam microscope

A particle beam microscope includes an illumination system generating a particle beam having a ring-shaped conical configuration. A selective detection system is configured to selectively detect one of two groups of particles having traversed the object region. The first group of particles includes the particles that traversed the object region un-scattered or scattered by a small scattering amount. The second group of particles includes particles scattered in the object region by a greater scattering amount.

Particle-beam microscope

A phase-shifting element for shifting a phase of at least a portion of a particle beam is described, as well as a particle beam device having a phase-shifting element of this type. In the phase-shifting element and the particle beam device having a phase-shifting element, components shadowing the particle beam are avoided, so that proper information content is achieved and in which the phase contrast is essentially spatial frequency-independent. The phase-shifting element may have at least one means for generating a non-homogeneous or anisotropic potential. The particle beam device according to the system described herein may be provided with the phase-shifting element.

Phase-shifting element and particle beam device having a phase-shifting element

An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.

Electron beam device

A phase contrast electron microscope has an objective with a back focal plane, a first diffraction lens, which images the back focal plane of the objective magnified into a diffraction intermediate image plane, a second diffraction lens whose principal plane is mounted in the proximity of the diffraction intermediate image plane and a phase-shifting element which is mounted in or in the proximity of the diffraction intermediate image plane. Also, a phase contrast electron microscope has an objective having a back focal plane, a first diffraction lens, a first phase-shifting element and a second phase-shifting element which is mounted in or in the proximity of the diffraction intermediate image plane. The first diffraction lens images the back focal plane of the objective magnified into a diffraction intermediate image plane and the first phase-shifting element is mounted in the back focal plane of the objective.

Phase contrast electron microscope

A particle beam apparatus has an optical axis (OA), an illuminating system () for illuminating an object, which is positioned in an object plane (), with a beam of charged particles and an objective () for imaging the illuminated object. The beam of charged particles is split at the object into a null beam and higher diffraction orders. The illuminating system is so configured that it generates an annularly-shaped illuminating aperture in a plane Fourier transformed to the object plane (). A phase-shifting element () is mounted in a focal plane () of the objective () or in a plane conjugated thereto. The focal plane () faces away from the object plane (). The phase-shifting element can be an einzel lens having two outer electrodes and one or several inner electrodes disposed therebetween when seen in the direction of the optical axis. The phase-shifting element can have an additional electrode at or near the optical axis.

Particle beam apparatus having an annularly-shaped illumination aperture

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Aalen, Germany

Gerd Ludwig Benner