Asml Netherlands B.v.

Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Gerben Pieterse

Ronald Van Der Ham

Thibault Simon Mathieu Laurent

Ruud Hendrikus Martinus Johannes Bloks

Johannes Henricus Wilhelmus Jacobs

Martijn Houben

Koen Steffens

Theodorus Wilhelmus Polet

Cornelius Maria Rops

Ivo Adam Johannes Thomas

Gregory Martin Mason Corcoran

Pieter Lein Joseph Gunter

Coen Cornelis Wilhelmus Verspaget

Raymond Wilhelmus Louis Lafarre

Erik Henricus Egidius Catharina Eummelen

Johan Gertrudis Cornelis Kunnen

Rogier Hendrikus Magdalena Cortie

Wilhelmus Franciscus Johannes Simons

Siegfried Alexander Tromp

Laurentius Johannes Adrianus Van Bokhoven

Sander Catharina Reinier Derks

Jim Vincent Overkamp

Han Henricus Aldegonda Lempens

Marinus Jan Remie

Ruud Olieslagers

Francis Fahrni

Van Vuong Vy

Frank Johannes Jacobus Van Boxtel

Petrus Franciscus Van Gils

Hubert Marie Segers

Jozef Augustinus Maria Alberti

Aart Adrianus Van Beuzekom

Pepijn Van Den Eijnden

Paul Van Dongen

Bas Willems

Johannes Jacobus Matheus Baselmans

Sergei Shulepov

Theodorus Marinus Modderman

Giovanni Luca Gattobigio

Marco Baragona

René Jos Houben

Johannes Christiaan Maria Jasper

Marinus Johannes Maria Van Dam

Leonardus Antonius Maria Brouwers

Norbertus Josephus Martinus Van Den Nieuwelaar

Johannes Cornelis Paulus Melman

Thomas Augustus Mattaar

Jean-Philippe Xavier Van Damme

Victor Manuel Blanco Carballo

Gerrit Oosterhuis

Bart Smeets

Willem Jan Bouman

Johannes Theodorus Guillielmus Maria Van De Ven

Federico La Torre

Pieter Debrauwer

Antonius Arnoldus Henricus Van Der Steen

José Nilton Fonseca, Jr

Jan-Piet Van De Ven

Frits Verhoeven

Thibault Laurent

Johannes Jacobs

Ruud Bloks

Han Lempens

Wilhelmus Simons

Raymond Lafarre

Rogier Cortie

A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

Fluid handling system and lithographic apparatus

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.

Lithographic apparatus with improved patterning performance

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

Lithographic apparatus, method of transferring a substrate and device manufacturing method

The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.

Setpoint generator, lithographic apparatus, lithographic apparatus operating method, and device manufacturing method

A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.

Lithography apparatus, and a method of manufacturing a device

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Lithographic apparatus and a method of manufacturing a lithographic apparatus

A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of the projection system and/or a component of the lithographic apparatus at least partially surrounding the final element of the projection system, and on the other side by a surface of the fluid confinement structure. The apparatus is configured to increase the humidity of the gas within the space.

Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus

A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

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Eindhoven, Netherlands

Gerben Pieterse