Asml Netherlands B.v.

Gerardus Martinus Antonius De Rooij

Martinus Hendrikus Antonius Leenders

Marcus Adrianus Van De Kerkhof

Roelof Frederik De Graaf

Nina Vladimirovna Dziomkina

Paulus Martinus Maria Liebregts

Martijn Houben

Vijay Kumar Badam

Johanna Antoinette Maria Sondag-Huethorst

Niek Elout De Kruijf

Leon Martin Levasier

Nicolas Alban Lallemant

Edwin Teunis Van Donkelaar

Evert Hendrink Jan Draaijer

A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

Lithographic apparatus, removable member and device manufacturing method

A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.

A lithographic apparatus includes a position quantity determination system to determine a position quantity of a movable part which is in operation at least partly surrounded by an area comprising a fluid. The position quantity determination system includes an interferometer system, a global sensor to determine a global value of a physical quantity of the fluid in the area, and a local sensor to determine a local value of the physical quantity of the fluid in the part of the area. The position quantity determination system is configured to determine the position quantity from an output of the interferometer, the global value of the physical quantity and the local value of the physical quantity. The physical quantity may include a pressure, a temperature, etc. The local physical quantity determination system may include a sensor, such as a high-speed sensor, a computational fluid dynamics model or a linear approximation model.

Lithographic apparatus, position quantity detection system and method

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Tilburg, Netherlands

Gerardus Martinus Antonius De Rooij