Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno

Gerardus Johan Jozef Winands

Paulus Willibrordus George Poodt

Freddy Roozeboom

Adrianus Johannes Petrus Maria Vermeer

Norbertus Benedictus Koster

Pieter Jan Bolt

Andrea Illiberi

Adriaan Marinus Lankhorst

Frank Theodoor Johannes Grob

The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the surface of the substrate; a passivation zone including a cavity provided with a passivation gas supply; said supply arranged for providing a passivation gas flow from the supply to the cavity; the cavity in use being bounded by the injector head and the substrate surface; and a gas purge structure comprising a gas exhaust arranged between said etch zone and passivation zone; the gas purge structure thus forming a spatial division of the etch and passivation zones.

Apparatus and method for reactive ion etching

The present invention relates to a method for enhancing the conductivity of an undoped transparent metal oxide to obtain a transparent conductive oxide (TCO) electrode. More in particular it relates to such a method comprising the steps of providing a transparent metal oxide, applying a UV transparent barrier layer on the transparent metal oxide, and irradiating the transparent metal oxide with UV radiation after applying the barrier layer.

Method of making a transparent metal oxide electrode

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Eindhoven, Netherlands

Gerardus Johan Jozef Winands