Asml Netherlands B.v.

Gerard Van Schothorst

Michael Jozef Mathijs Renkens

Sander Frederik Wuister

Johan Frederik Dijksman

Yvonne Wendela Kruijt-Stegeman

Andre Bernardus Jeunink

Catharinus De Schiffart

Erik Roelof Loopstra

Toon Hardeman

Norbert Erwin Therenzo Jansen

George Arie Jan De Fockert

Gregor Edward Van Baars

Jan Van Eijk

Robert-Han Munnig Schmidt

Felix Godfried Peter Peeters

Marc Wilhelmus Maria Van Der Wijst

Pertrus Rutgerus Bartray

Fransiscus Hendrikus Van Deuren

Johan Juliana Dries

Arie Jeffrey Den Boef

Vadim Yevgenyevich Banine

Dominicus Jacobus Petrus Adrianus Franken

Adrianus Hendrik Koevoets

Carolus Johannes Catharina Schoormans

Michael Jozefa Mathijs Renkens

Dominicus Jacobus Petrus A Franken

Mark Wilhelmus Maria Van Der Wijst

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Imprint lithography

An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

Imprint lithography apparatus and method

A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

Lithographic apparatus

A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

Lithographic apparatus and device manufacturing method

A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.

Growing community of inventors

Hedel, Netherlands

Gerard Van Schothorst