Agfa Gevaert Nv

Gerard Albert Delzenne

Hendrik E Kokelenberg

Urbain Leopold Laridon

Ludovicus Maria Mertens

Helmut Mader

Hans Ulrich

Theofiel Eveline Hermans

Bernhard Seidel

A recording method for directly forming a visible image, which method comprises exposing a recording material information-wise to ultra-violet radiation having a wave-length in the range of 200 nm to 400 nm, with a radiation intensity of at least 5.times.10.sup.11 erg/sq.cm.s so that the recording material receives a radiation energy dose of at least 1.times.10.sup.7 erg/sq.cm, the said recording material containing in a layer in admixture with an organic binder medium:

High intensity photon-image recording

Photo-sensitive film-forming soluble polymeric materials containing one or two polymers which can be insolubilized photochemically are disclosed. These polymeric materials contain in the same or different polymers (A) components which are reactive with moieties obtained by the photochemical decomposition of azidosulphonyl groups, e.g., a hydroxyl radical, pyridine, a phenyl radical, or a lactam radical; and (B) azidosulphonyl groups. The photo-sensitive material is insolubilized by exposure to actinic light. The material is useful in the production of photographic resists, printing plates for lithography, and the like.

Film-forming light-sensitive polymeric material carrying azidosulfonyl

A diazo recording process which comprises the steps of (1) information-wise exposing to ultra-violet light and (2) overall heating a recording material comprising a compound yielding an amine on heating, an ultra-violet light-sensitive diazo compound and a coupling component capable of yielding a dyestuff by reaction with unaffected diazo compound when heating said material and wherein the compound yielding an amine on heating corresponds with the following general formula: ##EQU1## in which: R.sub.1 represents

Diazo recording process and material

An electron beam-sensitive recording material that has a sensitivity to ultra-violet radiation not high enough to provide an optical density in the visible spectrum range of more than 0.2 when exposed with said radiation under the described test conditions, wherein said material comprises:

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'S-Gravenwezel, Belgium

Gerard Albert Delzenne