Puricore, Inc.

Cfmt, Inc.

Urgo Us, Inc.

Realm Therapeutics, Inc.

Gerald N DiBello

Mark N Sampson

Svetlana Panicheva

Vadim Panichev

Cary Schockemoehl

Steven Lewis Short

Noel J Pixley

Roger D Hall

Geoffrey Richard Koontz

Martyn James Rogers

Ronan Stapleton

Steven Verhaverbeke

Christopher F McConnell

The present invention provides a stabilized hypohalous acid solution (or formulation thereof), which may be conveniently packaged for sale, or stored for later use on demand. The invention further provides methods of making the stabilized hypohalous acid solution, as well as methods of use for disinfecting mammalian tissue, including wounds and burns, disinfecting or cleansing surfaces, or treating and/or preserving food products and cut flowers, among other uses.

Stabilized hypohalous acid solutions

The present invention provides a stabilized hypohalous acid solution (or formulation thereof), which may be conveniently packaged for sale, or stored for later use on demand. The invention further provides methods of making the stabilized hypohalous acid solutions, as well as methods of use for disinfecting mammalian tissue, including wounds and burns, and treating skin irritations, among other uses.

Methods for treating inflammation associated with allergic reaction

Methods for treating skin irritation

A method and system of providing a mist in a grocery display that injects biocidal solution into a misting line of water during a phase of the misting cycle.

Method of injecting solution into a misting line

The present invention relates to a pressure relief device and method of using the same. The pressure relief device includes a rupture element containing an inner layer made of an nonferrous-based composition that can preferably withstand contact with corrosive fluids. The inner layer of the rupture element is preferably the only part of the rupture element that is exposed to fluid in the system where it is installed. The pressure relief device may be installed in any system where overpressurization or underpressurization protection is desired. For example, the pressure relief device may be installed in systems where corrosive fluids are used and where an ultraclean environment is needed.

Pressure relief device and method of using the same

The present invention provides systems and methods of determining the concentration of chemicals in a wet processing stream where the wet processing stream is formed from two or more liquid streams having known chemical concentrations. The concentration of chemicals in the wet processing stream are monitored by measuring the flow rates of the liquid streams during combination to form the wet processing stream, and calculating the concentrations of chemicals in the wet processing stream based on the flow rates and known chemical concentrations of the liquid streams. The present invention also provides systems and methods for controlling the wet processing of semiconductor substrates using the calculated concentrations in the wet processing stream. The methods and systems of the present invention are particularly useful when the semiconductor substrates are contacted with the wet processing stream in a single pass.

Methods and systems for determining chemical concentrations and controlling the processing of semiconductor substrates

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West Chester, PA, United States of America

Gerald N DiBello