Applied Electroless Concepts Inc.

Ionics, Inc.

Integrated Process Equipment Corporation

Morton International, Inc.

Applied Chemical Technologies, Inc.

The Boc Group, Inc.

Speedfam-ipec Corporation

Athens Corporation

Ipec Clean, Inc.

Gerald A Krulik

John Andrew Adams

Nenad V Mandich

Rajwant Singh

Everett D Smith

Josh Harris Golden

Christopher S Blatt

Gennadiy Sverdlov

C Randall Harwood

Juzer Jangbarwala

Jay J Jung

Paul H Dick

David W Persichini

Dieter Dornisch

William Hannan

Nenad Mandich

A process for fluoride removal from wastewater streams produced during industrial operation for further industrial use or to comply with environmental regulations. The process segregates the removal of fluoride and fluorosilicate ions, from the totality of ions in the waste water stream, thus improving treatment efficiency and reducing costs. Ion-exchange chromatography is used to remove the fluoride and fluorosilicate ions by passing the wastewater stream through one or more columns that contain a charged resin which selectively binds cations/anions in the stream. The fluoride ions are washed from the column and then collected for removal or use in other processes.

Selective fluoride and ammonia removal by chromatographic separation of wastewater

A method of cleaning a filter clogged with flocculating materials is provided. The method comprises determining the flocculated materials clogged on the filter and adding a dispersing agent to break up said flocculated materials to form dispersed precipitates. Then the dispersed precipitates are removed from the filter in a regular cleaning such as backflushing.

Filter cleaning method

An improved method of treating wastewater to remove ammonia and fluoride is provided. The method comprises the steps of chemical destruction of ammonia with an oxidizing agent, followed by treatment with calcium salts to precipitate insoluble calcium fluoride, and filtration to remove the precipitate.

Simultaneous ammonia and fluoride treatment for wastewater

A system for removing fluoride from wastewater is provided. The system comprises a reaction tank for processing said wastewater by adding calcium salts, a filtration tank for removing the precipitated fluoride formed in the reaction tank, a single fluoride electrode disposed at the reaction tank for measuring a concentration of fluoride in the influent wastewater and providing an output signal, and a programmable controller for controlling addition of said calcium salts into said reaction tank. The programmable controller defines a setpoint of fluoride concentration in the reaction tank and automatically controls addition of calcium salts based on the setpoint and the output signal provided by the single fluoride electrode. A method of removing fluoride from wastewater is also provided.

System and method for removal of fluoride from wastewater using single fluoride sensing electrode

A method of removing arsenic and fluoride from aqueous solutions in the same process is provided. Specifically, the pH of the aqueous solution is adjusted to a pH in the range of about 5 to 8. A combination of calcium salts, and ferric or aluminum salts are added to form insoluble arsenic and fluoride bearing solids. The solids are then removed from the aqueous solution.

Method for simultaneous removal of arsenic and fluoride from aqueous solutions

A method of treating industrial wastewaters is provided. Specifically, the wastewater includes one or more organic contaminant materials and is pre-treated prior to filtering by the following steps The pH of the wastewater is adjusted to a pH in the range of about 2 to 6, and a combination of iron salts and peroxide are added to the wastewater and allowed to react for a period of at least about three minutes. Next, the pH of the wastewater is adjusted upwards to a value of at least 7 and precipitating or flocculating agents are added to form an insoluble contaminant bearing compound. The compound is then filtered from the wastewater thereby removing the contaminant materials from the wastewater. This invention is particularly suited for use with single pass flow-through filters, and most particularly suitable for high flow rate single pass flow-through filters. The method of the present invention results in minimization of filter clogging and maintenance of high filtration flow rates, with reduced need for cleaning cycles using lengthy treatment by acid based or detergent mixtures.

Method of treating industrial waste waters

Simultaneous non-contact plating and planarizing of copper interconnections in semiconductor wafer manufacturing is performed by providing relative motion between a bipolar electrode and a metallized surface of a semiconductor wafer without necessary physical contact with the wafer or direct electrical connection thereto.

Method for simultaneous non-contact electrochemical plating and

Plating of metal interconnections in semiconductor wafer manufacturing is performed by providing relative motion between a bipolar electrode assembly a single metallized surface of a semiconductor wafer without necessary physical contact with the wafer or direct electrical connection thereto.

Method and apparatus for non-contact metal plating of semiconductor

Planarization of metal interconnections in semiconductor wafer manufacturing is performed by providing relative motion between a bipolar electrode assembly scanned and a single metallized surface of a semiconductor wafer without necessary physical contact with the wafer or direct electrical connection thereto.

Method and apparatus for planarization of metallized semiconductor

A method for the removal and purification of substantially all of the fluoride ions contained in a solution containing greater than 10 parts per million (ppm) fluoride ion, a mixture of other anions, silicon in the form of a fluorosilicic acid, silicic acid, silicates, or silicon tetrafluoride, and optionally also containing complex metal fluorides, to produce an ultrapure hydrofluoric acid, comprising the steps of (a) adjusting the pH of the solution to an alkaline pH to hydrolyze the fluorosilicic acid and any complex metal fluorides; (b) removing the fluoride ions and other anions from the solution by passing the solution through an ion exchange resin, where the ion exchange resin is adapted to adsorb substantially all of the fluoride passed over the ion exchange resin; (c) displacing the fluoride ions and other anions bound to the ion exchange resin, thereby forming a mixture of anions in an effluent emanating from resin; (d) optionally concentrating the effluent at a high pH and then lowering the pH; and (e) distilling the mixture of anions in the effluent from a sulfuric acid solution to generate ultrapure hydrofluoric acid. An apparatus useful for practicing the method is also disclosed.

Separation and purification of fluoride from industrial wastes

A method for the on-site reprocessing of isopropyl alcohol used in semiconductor manufacturing, to generate an ultradry and ultrapure isopropyl alcohol. This ultradry and ultrapure isopropyl alcohol is produced through a pervaporation step, followed by double distillation. In the first distillation step, an autonomous azeotropic self-stripping distillation column is used to produce an ultradry and partially purified isopropyl alcohol. In the next step, the isopropyl alcohol is distilled in an overhead product distillation column, to produce an ultrapure and ultradry isopropyl alcohol. Alternatively, if the feed isopropyl alcohol contains less than 2000 ppm water, the pervaporation step may be omitted. The resulting isopropyl alcohol has between a high of 100 parts per million (ppm) and a low of 0.1 ppm of water in the isopropyl alcohol. It also has zero particles per milliliter of a size larger than 2.0 microns, zero to 2 particles per milliliter of a size of 0.5 micron to 2.0 microns, zero to 30 particles per milliliter of a size between 0.1 microns and 0.5 microns, an unspecified number of particles per milliliter below 0.1 microns, 1 part per trillion (ppt) to 1 part per billion (ppb) of any specific trace impurity such as metals, anions, and cations, and 10 ppt to 10 ppm of any other specific trace organic substances.

Dehydration and purification of isopropyl alcohol to an ultradry and

Waste water from an apparatus that rinses particles from semiconductor wafers is collected in a tank. A pump sends waste water from the tank through a particle filter and onward to a supply inlet for initial rinse stages of the processing apparatus. Some of the waste water is bleed from the tank and replenished by fresh water introduced into the final rinse stage of the apparatus. If the semiconductor processing so dictates, chemicals may be added to the waste water to alter the pH and/or prevent the precipitation of solids in the tank. The addition of such chemicals can be controlled automatically in response to sensed characteristics of the waste water.

Rinse water recycling method for semiconductor wafer processing equipment

This invention relates to a method for increasing the effective process life and chemical efficiency of use of aqueous-based developer solutions used for chemical development of photoresists such as are used in the printed circuit industry. The activity is maintained by regenerating some of byproducts during the process to active carbonate, by controlled additions of alkaline hydroxide instead if conventional carbonate solution. The pH and thus the development speed can automatically be controlled at any desired constant value. This invention allows simple automation of printed circuit photoresist development, with reduced chemical costs and increased chemical usage efficiency and thus reducing the industrial waste volume.

Life extension of photoresist developer solutions

Recycled slurry is continuously blended with the slurry in use to provide a consistent polishing rate while consuming or discarding a small fraction of the slurry flowing continuously across the polishing pad. The slurry is recovered in a catch ring and fed to a recycle loop to blend the recovered slurry with fresh slurry, rejuvenating chemicals, or water; test the blend; filter the blend; and return the blend to the polishing pad. The volume returned to the pad slightly exceeds the volume recovered, causing the catch ring to overflow. Rinse water is recycled in the same fashion to keep the polishing pad wet between polishing cycles.

Growing community of inventors

San Clemente, CA, United States of America

Gerald A Krulik