Saint-gobain Glass France

Saint-gobain Vitrage

Saint-gobain Vitrage International

Saint Gobain Isover

Georges Zagdoun

Bernard Nghiem

Philippe Boire

Eddy Royer

Emmanuel Valentin

Svetoslav Tchakarov

Maurice Trouve

Pierre Balian

Pierre Chaussade

Denis Guimard

Andriy Kharchenko

Anne Durandeau

Emilie Viasnoff

Jean-Francois M Oudard

Jérôme Douce

Vincent Legois

Ronan Garrec

Elin Sondergard

Etienne Barthel

Bertrand Kuhn

David Le Bellac

Jean Pegouret

Fabrice Abbott

Olivier Dubois

Anne Lelarge

Bruno Cordier

Victor Corinne

Jérôme Gilles

An electrically conductive OLED carrier includes in this order a glazing substrate; an electrode arranged in a metal grid made up of strands; an electrically insulating light extraction layer under the metal grid; and a layer partially structured in its thickness. The layer of refractive is of index n3 of 1.7 to 2.3, and is located on the light extraction layer. The partially structured layer is formed from a region structured with cavities at least partially containing the metal grid; and from another region, called the low region, located on the light extraction layer. The separation H between the surface of the structured region called the high surface, and therefore that furthest from the substrate, and the surface of the metal grid called the upper surface, and therefore that furthest from the substrate is, in absolute value, smaller than or equal to 100 nm.

Electrically conductive OLED carrier, OLED incorporating said carrier, and its manufacture

A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a solution of colloidal nanoparticles that are stabilized and dispersed in a first solvent is deposited, the particles having a given glass transition temperature T, the drying of the masking layer is carried out at a temperature below the temperature Tuntil a mask having a two-dimensional network of submillimetric openings is obtained with substantially straight mask area edges, in a zone referred to as a network mask zone, a zone free of masking is formed on the face by mechanical and/or optical removal of at least one peripheral portion of the network mask zone. The invention also relates to the network mask and the grid with an electroconductive solid zone that are thus obtained.

Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, mask having submillimetric apertures and submillimetric electrically conductive grid

The subject of the invention is a method of obtaining a heated window, comprising

Method for obtaining a heated glazing

A method of manufacturing a submillimetric electroconductive grid coated with an overgrid on a substrate includes: the production of a mask having submillimetric openings by the deposition of a solution of colloidal polymeric nanoparticles that are stabilized and dispersed in a solvent, the polymeric particles having a glass transition temperature Tand the drying of the masking layer at a temperature below the Tuntil the mask, with straight edges, is obtained, the formation of the electroconductive grid by a deposition of electroconductive material, referred to as grid material, a heat treatment of the masking layer with the grid material at a temperature greater than or equal to 0.8 times T, thus creating a space between the edges of mask zones and the lateral edges of the grid; a deposition of a layer, referred to as an overlayer, made of a material referred to as overlayer material, on the grid and in the space between the edges of mask zones and the lateral edges of the grid; a removal of the masking layer. The invention also relates to the grid thus obtained.

Method for manufacturing a submillimetric electrically conductive grid coated with an overgrid

A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a first solution of colloidal nanoparticles in a first solvent is deposited, the particles having a given glass transition temperature T, the drying of the masking layer, known as the first masking layer, is carried out at a temperature below said temperature Tuntil a mask having a two-dimensional network of substantially straight-edged submillimetric openings, that defines a mask zone known as a network mask zone is obtained, a solid mask zone is formed by a liquid deposition, on the face, of a second masking zone, the solid mask zone being adjacent to and in contact with the network mask zone, and/or at least one cover zone is formed, the cover zone being in contact with the network mask zone, and/or after the drying of the first masking layer, a filled mask zone is formed by filling, via a liquid route, openings of a portion of the network mask zone. The invention also relates to the mask and the electroconductive grid obtained.

Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, and mask and submillimetric electrically conductive grid

Glass substrate coated with layers having an improved mechanical strength

The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff.

Antifouling material and production method thereof

An optical filtering/electromagnetic screening structure for being joined to at least one transparent substrate, especially made of glass. The structure includes at least two plastic sheets and including, or intended to be joined to the sheets, a conducting electromagnetic screening element. At least one sheet is made of a thermoplastic, the other sheet constitutes a sheet for covering the conducting element or the thermoplastic sheet, and either one or both of the two sheets incorporate at least one mineral pigment or at least one organic dye to produce, in respect of the structure, an orange filter for light of wavelength centered on 590 nm.

Optical filtering and electromagnetic armouring structure

An electromagnetic shielding structure including at least a first transparent substrate, a conducting element, optionally a transparent backing sheet and a transparent tie sheet and a transparent additional sheet or covering sheet, and an electrical connector configured to be connected to the conducting element to ground the conducting element. At least one of the backing sheet, the tie sheet or the additional sheet or covering sheet, when present, is, at least on one of its sides, placed set back toward the interior of the structure relative to the associated free edge of the transparent substrate so as to leave a portion exposed on at least one of the faces of the conducting element, the connector being placed against and/or connected to this exposed portion.

Electromagnetic shield structure

The present invention is directed to a process for depositing at least one layer ( ) based on tungsten and/or on molybdenum by chemical vapor deposition on a non-conductive substrate ( ), such as glass, ceramic, glass-ceramic, or polymer, which includes providing at least one tungsten- and/or molybdenum-containing precursor in the form of a metal halide and/or of an organometallic compound, and at least one reducing agent, such as hydrogen or silane, to form the at least one metal layer. The present invention also relates to the substrate obtained by the preceding process and its applications, especially for producing a glazing, mirrors, or emissive screens.

Article formed by depositing a tungsten-based and/or molybdenum-based layer on a rigid substrate

Process for depositing a tungsten-based and/or molybdenum-based layer on a rigid substrate, and substrate thus coated

Process and apparatus for providing a film with a gradient

Glazing panel provided with a conductive and/or low emissivity film

Glazing pane having an anti-reflection coating

This invention is a product comprising a transparent substrate of the glass substrate type (1), coated with at least one thin film (4) based upon an oxide comprising silicon, aluminum and at least one third element M facilitating the formation of a homogeneous mixed oxide structure of silicon and aluminum. The invention also concerns a method of manufacturing coated glass, especially by a gas phase pyrolysis technique, and its applications.

Glazing pane equipped with at least one thin film and method of

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La Garenne Colombes, France

Georges Zagdoun