Rijksuniversiteit Te Groningen

Zetfolie B.v.

Georges Hadziioannou

Erik Kroeze

Gerrit Ten Brinke

Erik Maarten Terlouw

Bert De Boer

Hendrik-Jan Brouwer

Jacobus Christiaan Gerardus Maria Ruiter

Substrate ( ) and devices including such a substrate, the substrate having a first surface and a second surface extending substantially in parallel to the first surface, the substrate being of a material of a first conductivity and provided with a plurality of electrically conducting channels ( ) which are extending exclusively in a direction perpendicular to the first and second surfaces, said channels having a second conductivity substantially larger than the first conductivity, the substrate being provided with at least one electrode ( ) on either one of the first and second surfaces, contacting at least one of said channels, the at least one electrode ( ) having a predetermined minimum dimension (D) in a contact area (A) with the substrate, and mutual distances between adjacent ones of the plurality of channels ( ) being smaller than said minimum dimension of said at least one electrode ( ).

Substrate having a unidirectional conductivity perpendicular to its surface, devices comprising such a substrate and methods for manufacturing such a substrate

The present invention relates to a stable polymer composition comprising a first polymer and a second polymer, which second polymer is not compatible with the first polymer, and an amount of a copolymer comprising at least one block of a polyalkadiene and at least one block of random poly(aromatic vinyl-acrylonitrile), and in which the ratio of the block copolymer to the total polymer composition is between 1:500 and 1:50. Besides, the invention relates to the use of the above block copolymer as compatibilizer and/or as modifier for the mechanical properties of polymer compositions.

Block copolymers

The present invention relates to a block copolymer comprising at least one polyalkadiene block which may or may not be hydrogenated and at least one random (aromatic vinyl compound-co-maleic anhydride) block. Besides, the invention relates to a stable polymer composition comprising a continuous phase formed by a first polymer and a phase dispersed therein of a second polymer, which second polymer is not compatible with the first polymer, and an amount of the block copolymer according to the invention, the ratio of the block copolymer to the second polymer ranging between 1:50 and 1:5. Finally, the invention relates to the use of the block copolymers according to the invention as compatibilizer and/or as modifier for the mechanical properties of polymer compositions.

Block copolymer

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Peize, Netherlands

Georges Hadziioannou