Colorado State University Research Foundation

Other

Applied Electron Corporation

Covidien LP

Fujitsu Corporation

Ncr Corporation

Colromm, Inc.

Nippon Seiko Kabushiki Kaisha

Coviden LP

Lasertechnics, Inc.

George J Collins

Cameron A Moore

Il-Gyo Koo

John R McNeil

Zeng-gi Yu

Zeng-qi Yu

Jorge J Rocca

Myeong Yeol Choi

Arlen K Ward

Motoo Nakano

Tetsuro Tamura

Masao Yamada

Jack D Meyer

Jin-Hoon Cho

Jayaram Krishnaswamy

Akira Takazawa

Thomas S Snyder

Thomas V Congedo

Dean A Hendrickson

Frank H Ruddy

William E Bell

Werner A Metz, Jr

Shuzo Hattori

Paul A Sullivan

Masahiro Saita

Yoshiyuki Uchida

Masami Eishima

Paul K Boyer

Lance R Thompson

Doreene Hyatt

William H Carder

Ellen V Gray

Amber Zagrodzki

Jin Hoon Cho

Tien-yu Sheng

Jeremiah H Collins

Abdur Rahman

Douglas A Scott

Dai Sugimoto

Il-gyo Koo

Heesang Youn

K Antioco Douglas

Paul Y Kim

Douglas K Antioco

The present disclosure provides for a plasma system including a plasma device coupled to a power source, an ionizable media source and a precursor source. During operation, the ionizable media source provides ionizable media and the precursor ionizable media source provides one or more chemical species, photons at specific wavelengths, as well as containing various reactive functional groups and/or components to treat the workpiece surface by working in concert for synergetic selective tissue effects. The chemical species and the ionizable gas are mixed either upstream or midstream from an ignition point of the plasma device and once mixed, are ignited therein under application of electrical energy from the power source. As a result, a plasma effluent and photon source is formed, which carries the ignited plasma feedstock and resulting mixture of reactive species to a workpiece surface to perform a predetermined reaction.

Plasma-based chemical source device and method of use thereof

A plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.

System and methods for plasma application

A plasma system for treating a workpiece is disclosed. The plasma system includes: a plasma device including an electrode formed from a metal alloy and a dielectric layer covering the electrode, the dielectric layer including a distal portion extending distally past a distal end of the electrode by a predetermined distance; a liquid source configured to supply a liquid to a workpiece; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the electrode and configured to ignite the ionizable media at the plasma device to form a plasma effluent in the presence of the liquid, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts with the workpiece.

Liquid-gas interface plasma device

An electrosurgical generator is disclosed. The generator includes a radio frequency output stage configured to generate a radio frequency waveform and a sensor circuit configured to measure a property of the radio frequency waveform during a predetermined sampling period to determine whether an arc event has occurred. The generator also includes a controller configured to determine a total charge and/or total energy deposited by the radio frequency waveform during the predetermined sampling period associated with the arc event. The controller is further configured to adjust the output of the electrosurgical generator based on at least one parameter to limit arcing.

Real-time arc control in electrosurgical generators

A plasma system is disclosed. The system includes a plasma device including an inner electrode and an outer electrode coaxially disposed around the inner electrode, wherein at least one of the inner electrode and the outer electrode is temperature controlled; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media at the plasma device to form a plasma effluent.

System and method for treatment of biofilms

A system for performing a surgical procedure includes a source of energy, a surgical instrument, and an impedance matching network. The source of energy is an electrosurgical generator or a microwave generator. The surgical instrument is coupled to the source of energy and receives the energy therefrom. The surgical instrument is adapted to treat tissue with the energy. The impedance matching network is interposed along a path of the energy and matches an input impedance of the source of energy to an output impedance (or thereabouts).

System and method of matching impedances of an electrosurgical generator and/or a microwave generator

A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.

Plasma catalyst chemical reaction apparatus

A method for whitening teeth is disclosed. The method includes supplying a liquid sufficient to at least partially submerge a portion of a tooth; positioning a plasma device adjacent to the submerged portion of the tooth; supplying ionizable media to the plasma device; and igniting the ionizable media at the plasma device sufficient to form a plasma effluent in the presence of the liquid at the distal portion, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts selectively with foreign matter disposed on the tooth.

An electrosurgical system and method for performing electrosurgery is disclosed. The electrosurgical system includes an electrosurgical generator adapted to supply electrosurgical energy to tissue. The electrosurgical system includes an electrosurgical instrument, such as an electrosurgical antenna, knife, forceps, suction coagulator, or vessel sealer. The disclosed system includes an impedance sensor, a controller, dynamic impedance matching network, and an electrosurgical energy generator. The dynamic impedance matching network includes a PIN diode switching array configured to selectively activate a plurality of reactive elements. The disclosed arrangement of reactive elements provides real-time impedance correction over a wide range of impedance mismatch conditions.

Microwave and RF ablation system and related method for dynamic impedance matching

The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.

A plasma generating system, related method and device are disclosed. The plasma generation system includes a plasma generation device, a source of ionizable gas and a driver network. The plasma generation device includes a housing, an electrode, and a resonant circuit. The housing includes a passage defined therein and directs a flow of ionizable gas therethrough. The electrode is coupled to the ionizable gas flowing through the passage of the housing. The resonant circuit includes a capacitor and an inductor connected together in series. The resonant circuit has a resonance frequency and is coupled to the electrode. The resonant circuit receives an AC signal. The driver network provides the AC signal such that the AC signal has a frequency and excites the ionizable gas flowing through the passage of the housing to a plasma.

System, method and apparatus for generating plasma

The present invention provides for methods for on-line monitoring of a molten process phase to determine the extent of extraction of radioactive species from a waste metal contaminated with the radioactive species. The waste metal is mixed with an inorganic flux material in a furnace, wherein the flux material extracts the radioactive species from the waste metal. Periodically, a portion of the furnace composition is sampled from the furnace and separated into a molten flux phase and a molten metal phase. Either of these phases is then analyzed in its molten state to determine the extent of the extraction process.

Metal decontamination process and systems for accomplishing same

An Si or SiC semiconductor layer is subjected to anodic oxidation in an HF solution to form a porous semiconductor layer. Without drying, the porous semiconductor layer is then immersed in pure water. Ultrasonic waves applied to the pure water shorten the reaction time and help bubbles separate from the surface of the porous region. The porous semiconductor layer is used for forming a pn junction, and carriers are injected into the pn junction.

Method for manufacturing porous semiconductor light emitting device

Growing community of inventors

Fort Collins, CO, United States of America

George J Collins