Asml Holding N.v. & Asml Netherlands B.v.

George Grigorievich Voevodkin

Earl William Ebert

Pedro Julian Rizo Diago

A reticle stage cleaning apparatus for a reticle stage in a lithographic apparatus includes a substrate having a frontside and a backside opposite the frontside and a conductive layer disposed on the frontside of the substrate. The conductive layer is configured to contact the reticle stage to dissipate charge on the reticle stage and to remove particles on the reticle stage via an electrostatic field generated between the conductive layer and the reticle stage. The substrate can include a plurality of grooves and the conductive layer can be disposed on the frontside of the substrate and on a bottom surface of the plurality of grooves. The reticle stage cleaning apparatus can include a second conductive layer configured to remove particles on the reticle stage via a second electrostatic field and be disposed atop the conductive layer in the bottom surface of the plurality of grooves.

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Ossining, NY, United States of America

George Grigorievich Voevodkin