Akzo America Inc.

Akzo N.v.

George E Whitwell

John H Deatcher

Andrea Leone-Bay

Meiylin F Antezzo

William E Estes

A process for forming an alkoxide-derived yttrium-barium-copper oxide high temperature superconductor thin film by sol-gel processing is disclosed. It comprises first forming a thin film comprising solubilized yttrium and barium alkoxides and copper aminoalkoxide, under an inert gas atmosphere, on a non-reactive substrate, the amount of copper amino alkoxide being in excess of the stoichiometric amount to compensate for losses due to volatility of the copper amino alkoxide. The coating composition is then heated first in a moisture laden inert gas atmosphere, to hydrolyze the alkoxides, to temperatures in excess of the formation temperature of the superconductor. It is thereafter calcined in an oxygen atmosphere at higher temperatures to form the high temperature superconductor thin film.

Formation of high temperature superconductor thin films by sol-gel

Copper oxide films can be formed on a substrate by coating the substrate with an organic solvent containing an aminoalkoxy copper(II) compound, and pyrolyzing the thus formed coating. The aminoalkoxy copper compound can be a bis(aminoalkoxy)copper(II) compound, a bis(alkylaminoalkoxy) copper(II) compound, or mixtures thereof.

Bis(aminoalkoxy) and bis(alkylaminoalkoxy)copper(II) solutions,

Oligomers and polymers, useful as interlayer dielectric films, are formed by the co(hydrolysis/condensation) of an aryl group-containing trifunctional silanetriol or derivative with a tetrafunctional silicic acid compound. The respective tri- and tetrafunctional substituents on either silicon compound reaction are chosen so that they act as reactants in condensation oligomerization or polymerization reactions with the substituents on the other reactant.

Arylsiloxane/silicate compositions useful as interlayer dielectric films

The etching of cured arylsiloxane/silicate resin coatings with HF is improved if the curing of said coatings, prior to etching, comprises curing with energy ray irradiation.

Energy ray curing of arylsiloxane/silicate compositions and subsequent

Striation-free interlayer dielectric films of good reflectivity are formed by spin-coating a solution comprising 1,2,4-trimethylbenzene solvent containing a dissolved arylsiloxane oligomer or polymer capable of forming an interlayer dielectric film.

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Campbell Hall, NY, United States of America

George E Whitwell