Az Electronic Materials USA Corp.

Merck Patent Gmbh

Georg Pawlowski

Ralph R Dammel

Mark O Neisser

Joseph E Oberlander

David J Abdallah

Chunwei Chen

Andrew R Romano

Robert R Plass

John Biafore

Robert Plass

A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.

Process of imaging a photoresist with multiple antireflective coatings

The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R' is selected independently from hydrogen, (C-C)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, Rto Rare independently selected from hydrogen, hydroxyl, (C-C) alkyl and chlorine, Xand Xare independently oxygen or N&#x2014;R, where Ris hydrogen or (C-C) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.

Negative photoresist compositions

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Bridgewater, NJ, United States of America

Georg Pawlowski