Von Ardenne Asset Gmbh &co. Kg

First Solar, Inc.

Von Ardenne Anlagentechnik Gmbh

Georg Laimer

Ricky Charles Powell

James B Foote

Hubertus Von Der Waydbrink

James Ernest Hinkle

Reinhard Jaeger

Jens Melcher

Lutz Gottsmann

Siegfried Scheibe

Erwin Zschieschang

Christoph Haeusler

Joerg Pollack

Robert Kuenanz

Bjoern Hornbostel

James R Foote

Coating processes for vacuum chamber arrangements and apparatus thereof are herein disclosed. In some aspects, a coating process may include coating at least one workpiece using a vacuum chamber arrangement. The vacuum chamber arrangement may include a vacuum chamber, a substrate holding arrangement, an additional substrate holding arrangement, one or more bearings, a supply hose and an additional supply hose. The vacuum chamber may include a lock chamber, an additional lock chamber, a heating chamber, an additional heating chamber, and a coating chamber. The one or more bearings may support the substrate holding arrangement in such a way that it can be moved between the lock chamber and the coating chamber. The one or more bearings may also support the additional substrate holding arrangement in such a way that it can be moved between the additional lock chamber and the coating chamber.

Coating processes for vacuum chamber arrangements and apparatus thereof

A vacuum chamber having a vacuum chamber; at least one processing region arranged in the vacuum chamber; and a substrate holding arrangement for transporting and/or positioning a substrate or multiple substrates in the processing region, wherein the substrate holding arrangement has: a first drive train with a first substrate holder, the first substrate holder being configured to rotatably hold one or more substrates, a second drive train with a first support arm, wherein the first substrate holder is held rotatably by the first support arm, a third drive train with a second substrate holder, the second substrate holder being configured for rotatably holding one or more substrates, and a fourth drive train with a second support arm, wherein the second substrate holder is held rotatably by the second support arm, and wherein the first, second, third and fourth drive trains are each configured to be controllable independently of one another.

Vacuum chamber arrangement and method for processing a substrate

In accordance with various embodiments, provision is made of a substrate holding device, wherein the latter may comprise a carrier plate with a recess, the recess extending from an upper side of the carrier plate to a lower side of the carrier plate through the carrier plate, a holding frame, which has a frame opening and a support area, surrounding the frame opening, for holding a substrate in the recess, wherein the holding frame inserted into the recess lies on the carrier plate in sections.

Substrate holding device, substrate transport device, processing arrangement and method for processing a substrate

A transport device and method of transporting a substrate using a rotatable shaft and baffles may be used to extend cleaning intervals for the transport device and reduce deposition of a vapor deposition material upon the transport device.

Transporting device, in particular for transporting sheet-like substrates through a coating installation

The transporting device according to the invention, in particular for transporting sheet-like substrates through a coating installation, comprises transporting rollers which are rotatably mounted on both sides and horizontally arranged transversely in relation to the transporting direction, the uppermost surface lines of the transporting rollers defining the transporting plane, and is characterized in that the end parts of the transporting rollers have a smaller diameter than the middle part of the transporting rollers and in that baffles which are mounted displaceably in the axial direction of the transporting rollers between a first position and a second position are arranged between the end parts of the transporting rollers and the transporting plane. The fact that the baffles are mounted in an axially displaceable manner has the effect of considerably extending the cleaning intervals of the transporting device. At first the baffles are arranged in a first position, in which the end of the baffle lies underneath the substrate and, in the horizontal direction, as close as possible to the middle of the transporting roller Vapor-depositing material that gets beyond the edge of the substrate hits the baffle. During operation of the transporting device, the baffles are continuously displaced from the middle part to the ends of the transporting rollers. As a result, the increase in thickness of the layer produced on the baffles is limited, since the vapor keeps hitting new portions of the baffle.

Transport device, in particular for transporting sheet-like substrates through a coating installation

Growing community of inventors

Meissen, Germany

Georg Laimer