Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh

Wacker Siltronic Gesellschaft Fur Halbleitermaterialien

Georg Hochgesang

Anton Schnegg

Roland Brunner

Hans Adolf Gerber

Alfred Pardubitzki

Werner Zipf

Manfred Schmiedlindl

Arthur Schweighofer

Gertraud Thalhammer

A cleaning agent and method are useful for cleaning semiconductor wafers. The aqueous cleaning agent has a pH of 1 to 5, preferably a pH of 1 to 3, and contains at least one surfactant and at least one compound which belongs to a group of compounds comprising succinic acid and its derivatives. To clean the semiconductor wafers, a thin film of cleaning agent is generated on the side faces of the semiconductor wafers, preferably using a mechanical tool.

Cleaning agent and method for cleaning semiconductor wafers

A wafer holding device including a frame (2) which surrounds a wafer (1) ch is received without contact, which can be moved with the wafer having at least three holding elements (3) which are directed toward the outside circumference of the wafer and which can be changed from a holding position to a release position. The wafer can be supported in the holding device during many steps associated with movement in the production process so that a multiplicity of gripping and release operations which stress the wafer surface are unnecessary.

Holding device and method for treating wafer-like objects, and a method

Growing community of inventors

Burghausen, Germany

Georg Hochgesang