Siemens Medical Laboratories, Inc.

Georg A Weidlich

A method for applying a radiation treatment with an arbitrary isodose profile is disclosed. The treatment apparatus has a radiation source which generates a radiation beam with an axis. The apparatus also includes a collimator having a plurality of independently movable plates disposed in the path of the radiation beam and oriented in a direction perpendicular to said beam axis. Each set has two movable plates. Control signals are generated. Two plates within a set of plates are actuated independently in orthogonal directions during the treatment, in response to the control signals, causing the beam to change in width. The intensity of the beam is changed as a function of the position of the plates to generate an arbitrary beam profile. Exemplary profiles which may be generated included rotationally symmetric parabolic profiles and flat profiles.

Method for dynamic beam profile generation

A system for applying radiation treatment under computer control is disclosed. The system has a radiation source, which generates a variable intensity radiation beam, and a collimator. The collimator has a plurality of movable plates disposed in the path of the radiation beam and is oriented in a direction perpendicular to the beam axis. The apparatus is capable of actuating the plates independently during the radiation treatment, in response to a first control signal. The beam changes in width when the plates are so actuated. The collimator is rotated in response to a second control signal. The intensity of the radiation beam may be varied as a function of the plate position. A total radiation dosage is applied during two intervals. The first interval precedes the collimator rotation, and the second interval follows the rotation.

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Concord, CA, United States of America

Georg A Weidlich