Lg Chem, Ltd

Lg Display Co., Ltd.

Geon-Yong Kim

Seong-Pil Kang

Boo-Gon Woo

Kyoung-Su Ha

Eun-Ha Lee

Seok-Hwan Choi

Boo-Gon c/o Lg Chemical DevCorp Woo

Sang-Youn Lee

Koo-Hyun Kang

Seok-Hwan c/o Lg ChemDevCorp Choi

A substrate cleaning apparatus includes: a substrate entering guide unit for entering a substrate from outside in a proper direction; a foreign material removing unit for receiving the substrate from the substrate entering guide unit and removing debris formed on the substrate; a foreign material cleaning unit for receiving the substrate from the foreign material removing unit and cleaning to remove debris remaining on the substrate; and a position controller for controlling the position of the substrate carried out of the foreign material cleaning unit, wherein the foreign material cleaning unit includes: a manifold including a plurality of deionized water holes, suction holes and air holes; and a porous cleaning plate combined to the manifold by an upper fastening screw including a through hole communicating with the plurality of deionized water holes and suction holes.

Apparatus for cleaning substrate

A heat exchange-type reactor includes a reaction chamber () having mounted therein a plurality of contact tubes () filled with a catalyst material; at least one shield plate () mounted within the reaction chamber to partition an inner space of the reaction chamber into at least two separate spaces (); a plurality of conduits () having entrance () and exit () openings through which a heat transfer medium respectively enters and exits, and being mounted to an outer circumference of the reaction chamber () corresponding to the partitioned spaces (); and a heat exchange unit connected to the conduits () to perform heat exchange of the heat transfer medium, in which the heat exchange unit includes a single heat exchanger that performs the exchange of heat of the heat transfer medium in accordance with the partitioned spaces.

Catalytic oxidation reactor with enhanced heat exchanging system

The present invention relates to a facility parts cleaning solution for the processing of (meth)acrylic acid and/or (meth)acrylic esters and a cleaning method using the cleaning solution. An aqueous cleaning composition comprising 5 to 50 wt % of at least one alkali metal hydroxide selected from the group consisting of sodium hydroxide and potassium hydroxide, 0.01 to 1 wt % of a water-soluble amino acid, 0.001 to 0.05 wt % of N,N'-methylene bisacrylamide, and 0.001 to 0.05 wt % of azobisisobutyronitrile is used to clean facility parts for manufacturing (meth)acrylic acid and/or (meth)acrylic esters in order to easily remove polymers and deposits.

Facility parts cleaning solution for processing of (meth)acrylic acid and/or (meth)acrylic esters and cleaning method using said cleaning solution

Growing community of inventors

Seoul, South Korea

Geon-Yong Kim