Growing community of inventors

Fort Collins, CO, United States of America

Geoffrey N Drummond

Average Co-Inventor Count = 1.72

ph-index = 10

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 559

Geoffrey N DrummondRichard A Scholl (6 patents)Geoffrey N DrummondBryce L Hesterman (2 patents)Geoffrey N DrummondJeffery M Monheiser (2 patents)Geoffrey N DrummondJohn G Harpold (1 patent)Geoffrey N DrummondVladislav V Shilo (1 patent)Geoffrey N DrummondGeorge W McDonough (1 patent)Geoffrey N DrummondTim Kerr (1 patent)Geoffrey N DrummondShane A Lloyd (1 patent)Geoffrey N DrummondGeoffrey N Drummond (15 patents)Richard A SchollRichard A Scholl (14 patents)Bryce L HestermanBryce L Hesterman (13 patents)Jeffery M MonheiserJeffery M Monheiser (2 patents)John G HarpoldJohn G Harpold (4 patents)Vladislav V ShiloVladislav V Shilo (4 patents)George W McDonoughGeorge W McDonough (3 patents)Tim KerrTim Kerr (1 patent)Shane A LloydShane A Lloyd (1 patent)
..
Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Advanced Energy Industries, Inc. (10 from 333 patents)

2. Colorado Power Electronics, Inc. (2 from 2 patents)

3. Other (1 from 832,718 patents)

4. Aerojet-general Corporation (1 from 211 patents)

5. Aerojet Rocketdyne, Inc. (1 from 68 patents)


15 patents:

1. 9450482 - Fault recovery for multi-phase power converters

2. 8572945 - High voltage multiple phase power supply

3. 8462525 - Wide range DC power supply with bypassed multiplier circuits

4. 7631482 - Multiple phase power supply for rocket engines

5. 6844802 - Parallel core electromagnetic device

6. 6697265 - Wide range DC power supply utilizing voltage doubling output capacitors and inductive choke to extend full power load impedance range

7. 6633017 - System for plasma ignition by fast voltage rise

8. 6521099 - Periodically clearing thin film plasma processing system

9. 6217717 - Periodically clearing thin film plasma processing system

10. 6024844 - Enhanced reactive DC sputtering system

11. 6001224 - Enhanced reactive DC sputtering system

12. 5718813 - Enhanced reactive DC sputtering system

13. 5576939 - Enhanced thin film DC plasma power supply

14. 5535906 - Multi-phase DC plasma processing system

15. 5427669 - Thin film DC plasma processing system

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as of
12/11/2025
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