Raytheon Canada Limited

Raytheon Company

Geoffrey George Harris

Daniel Bruce Mitchell

Douglas J Brown

William Conrad Stenton

Alexandre Lifchits

Andrew James Gabura

Gerard Desroches

Bob Scott

Anthony A Light

Mark A Handerek

A deposition apparatus includes a deposition source that produces a deposition flow of a deposited material and has an evaporation source with a material to be deposited therein, and a sputtering source that produces sputtering ions directed at the material to be deposited in the evaporation source. A deposition target is in facing relationship to the deposition source. The sputtering source is operated simultaneously with the evaporation source.

Sputter-enhanced evaporative deposition apparatus and method

A method involves creating a recess in a surface of a part so the recess is adjacent a portion of the part, thereafter forming a coating on the surface of the part with a portion of the coating being disposed in the recess, and thereafter removing material of the portion of the part with a tool. According to a different aspect, an apparatus includes a recess-forming section that forms a recess in a surface of a part so the recess is adjacent a portion of the part, a coating section that forms a coating on the surface of the part with a portion of the coating disposed in the recess, and a material-removing section that subsequently removes material of the portion of the part with a tool.

Method and apparatus for cutting a part without damaging a coating thereon

A method and apparatus involve: routing first radiation and second radiation respectively having first and second wavelengths that are different along respective first and second optical paths; reflecting the first radiation with an optical component as the first radiation is traveling along the first optical path; and reflecting the second radiation with the optical component as the second radiation is traveling along the second optical path, the optical component causing a first optical path length traveled by the first radiation along the first optical path from arrival at to departure from the optical component to be shorter than a second optical path length traveled by the second radiation along the second optical path from arrival at to departure from the optical component.

Method and apparatus for pathlength adjustment in an optical system

A method involves forming a first surface on a substrate, applying to the first surface a layer of a material having a thickness less than approximately 10 microns, and precision polishing the layer of material to form a precision optical second surface on a side of the layer opposite from the substrate. A different aspect involves an apparatus that includes a substrate having a first surface, and a layer provided on the surface and having a thickness less than approximately 10 microns, the layer having on a side thereof opposite from the substrate a polished second surface with an RMS surface roughness less than approximately 10 Angstroms.

Method and apparatus for fabricating a precision optical surface

One aspect involves: supporting a workpiece with workpiece support structure that includes spaced support parts, a support section supporting the support parts, and a workpiece holding adhesive on each support part, where the adhesives engage respective regions of a surface portion on the workpiece; and supplying a coating material toward a different surface portion of the workpiece. A different aspect involves: supporting a workpiece with workpiece support structure that includes a workpiece support member with a surface portion extending approximately parallel to a direction, and a workpiece support part having two adhesive portions that respectively engage the surface portion on the support member and a surface portion on the workpiece; and supplying a coating material in the direction, toward a different surface portion of the workpiece.

Method and apparatus for supporting workpieces in a coating apparatus

An apparatus includes a workpiece support, a source that is spaced from the workpiece support and can emit a plume of coating material toward the workpiece support, and plume adjusting structure that, between the source and workpiece support, can influence a plume of material flowing from the source. A different aspect involves a method that includes emitting from a source a plume of coating material that flows toward a workpiece support, and adjusting, between the source and the workpiece support, a plume of material flowing from the source.

Method and apparatus for coating a curved surface

An apparatus includes a workpiece support, a source for emitting a plume of coating material that flows toward the workpiece support, and plume influencing structure between the source and the workpiece support. The plume influencing structure includes a shield with plural openings extending therethrough approximately parallel to a general direction of flow of the plume away from the source. According to a different aspect, a method includes emitting from a source a plume of coating material that flows toward a workpiece support, and adjusting the flow of the plume with a shield between the source and the workpiece support, the shield having plural openings extending therethrough approximately parallel to a general direction of flow of the plume.

Method and apparatus for coating surfaces

An apparatus includes an optical filter having first and second passbands that are different, the optical filter including selectively operable first passband adjusting structure that varies a characteristic of the first passband without influencing the second passband. According to a different aspect, a method includes filtering radiation with an optical filter having first and second passbands that are different, and selectively varying a characteristic of the first passband without influencing the second passband.

Method and apparatus for optical filtering with two passbands

A workpiece support member can rotate about an axis relative to a source, and the source can emit a plume of coating material that flows toward the workpiece support member approximately parallel to the axis. A plume-influencing shield can rotate with the workpiece support member, and has a plurality of openings extending therethrough approximately parallel to the general direction of flow of the plume. According to a different aspect, a method involves: rotating a workpiece support member about an axis relative to a source; emitting from the source a plume of coating material that flows toward the workpiece support member approximately parallel to the axis; and influencing the plume with structure that includes a shield rotating with the workpiece support member, the shield having a plurality of openings extending therethrough approximately parallel to the general direction of flow of the plume.

A method involves: determining a percentage by which a thickness of a layer of material, if applied by a selected coating apparatus to a curved surface on a selected optical component having an operating wavelength, would decrease from a central region of the curved surface to an edge region of the curved surface; formulating a multi-layer optical coating that will provide, in the central region of the curved surface, a specified optical performance characteristic for all radiation within a waveband extending from the operating wavelength to a further wavelength, where the further wavelength decreased by the percentage equals the operating wavelength; and using the selected coating apparatus to form the multi-layer optical coating on the curved surface.

An ellipsometer is used to analyze each of a plurality of sample portions that each include a substrate portion with a coating portion thereon, the substrate portions corresponding to respective spaced portions of a part with a curved surface. For each sample portion, the analysis includes: directing onto the coating portion a beam of radiation that includes first and second components with different polarizations; detecting energy of each of the first and second components reflected by the sample portion; and generating data that includes, for each of a plurality of different wavelengths, information regarding a change caused by the sample portion to a relationship between the first and second components.

Method and apparatus for analyzing coatings on curved surfaces

A path of travel for radiation extends to one optical element, then to another optical element, and then away from the latter. One of the optical elements is respectively reflective and non-reflective to radiation above and below a first wavelength, and the other is respectively reflective and non-reflective to radiation below and above a second wavelength. According to a different aspect, a path of travel for radiation extends to one of first and second optical elements, then to the other optical element, and then away from the latter. The first optical element is reflective and non-reflective to radiation on respective sides of a first wavelength, and the second optical element is reflective and non-reflective to radiation on respective sides of a second wavelength. The first optical element can tilt in relation to the path of travel to change the first wavelength.

Method and apparatus for optical bandpass filtering, and varying the filter bandwidth

A light source includes a first set of first beam sources having parallel output beams lying in a first-beam-source plane and a second set of second beam sources having parallel output beams lying in a second-beam-source plane. The first-beam-source output beams are parallel to the second-beam-source output beams, but are spatially offset in a direction perpendicular to the first-beam-source output beams. A spatial optical interleaver disposed receives the first-beam-source output beams and the second-beam-source output beams. The first-beam-source output beams pass unimpeded through a set of first-beam openings in the spatial optical interleaver, and the second-beam-source output beams are reflected parallel to the first-beam-source output beams and in the first-beam-source plane.

Light source having spatially interleaved light beams

A detector calibration reference is disposed along a path of travel for radiation that extends from a radiation source to a radiation detector. The detector calibration reference has mutually exclusive first and second portions that are offset in a direction transverse to the path of travel, the first portion being substantially opaque to radiation from the source, and the second portion being substantially transmissive to radiation from the source. The detector calibration reference is moved relative to the path of travel in a manner so that the first and second portions become successively aligned with the path of travel.

Optical reference, and a method of using same

An electron-beam deposition system includes an evaporation source having a source target with a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location. A trailing-indicator monitor measures a past evaporation performance of the evaporation source and has a trailing-indicator output, and a leading-indicator monitor measures a future evaporation performance of the evaporation source and has a leading-indicator output. A controller receives the trailing-indicator output and the leading-indicator output, and controls the electron-beam source responsive to the trailing-indicator output and to the leading-indicator output. Preferably, the trailing-indicator monitor measures a deposition of the deposition material on a monitored substrate, and the leading-indicator monitor measures a brightness of the deposition material in the evaporation source.

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Midland, Canada

Geoffrey George Harris