Panasonic Corporation

Panasonic Liquid Crystal Display Co., Ltd.

Genshirou Kawashi

Takahiro Kawashima

Arinobu Kanegae

Yuji Kishida

A substrate; a gate electrode formed above the substrate; a gate insulating film formed above the gate electrode; a crystalline silicon semiconductor layer formed above the gate insulating film; an amorphous silicon semiconductor layer formed above the crystalline silicon semiconductor layer; an organic protective film made of an organic material and formed above the amorphous silicon semiconductor layer; and a source electrode and a drain electrode formed above the amorphous silicon semiconductor layer interposing the organic protective film are included, and a charge density of the negative carriers in the amorphous silicon semiconductor layer is at least 3&#xd7;10cm.

Growing community of inventors

Chiba, Japan

Genshirou Kawashi