Speedfam-ipec Corporation

Gene Hempel

Mike L Bowman

Chris E Karlsrud

Craig M Howard

Franklin D Root

Yushin Son

Tim Dyer

The present invention provides a dual purpose workpiece handoff station for intermediately staging a semiconductor wafer, or other workpiece, being transferred between processing stations in, for example, a Chemical-Mechanical Planarization (CMP) machine. The handoff station includes a workpiece processing surface; such as a polishing pad or buffing pad, defining a plurality of apertures for applying fluids, including water, chemicals, slurry, or vacuum, to the surface of a workpiece. In operation, a workpiece carrier moves a polished wafer from a primary polishing surface to the handoff station, and polishes, buffs, or cleans the wafer in the handoff station by rotating the wafer and oscillating the wafer across the handoff station polishing surface while pressing the wafer thereon.

Dual purpose handoff station for workpiece polishing machine

Wafer polishing systems include a series of polish modules alongside a neighboring series of secondary modules. A conveyor travels along the series of polish modules and the series of secondary modules. When a polishing operation is completed, the wafers are transferred to a series of near-by storage modules. The polish modules include a pair of traveling wafer gantries, each of which delivers a wafer to a polishing surface, applying the necessary force to complete polishing of the wafer surface.

Arrangements for wafer polishing

A method for planarizing the surface of a wafer against a polishing pad includes the steps of securing the wafer in a carrier, pressing the wafer against the polishing pad, rotating both the wafer and pad, and moving the wafer across the polishing pad to create one or more geometric patterns relative to the pad. Geometric patterns employed by the present method include a 'figure eight', an elliptical pattern, and a peanut-shaped pattern. In one embodiment of the invention, both a 'figure eight' pattern and an elliptical pattern are used during a single planarizing operation. Bezier splines (curves) are used to create geometric patterns employed by the planarizing process. The use of Bezier splines requires that only two endpoints and two control points be stored in a memory device to represent the entire curve between the two endpoints, thus reducing the amount of data that has to be stored and transferred in order to operate a programmable wafer carrier in accordance with the present method.

Method for chemical mechanical polishing using synergistic geometric patterns

A method and apparatus for facilitating the removal and replacement of polishing pads utilized in the process of polishing and planarizing workpieces such as semiconductors where the polishing machine employed includes a rotatable platen. The apparatus for facilitating the removal and replacement of polishing pads includes a top plate for securing a polishing pad thereto and means for removably mounting the top plate to the rotatable platen in the polishing machine. Means for removably mounting the top plate to the rotatable platen preferably includes a plurality of electromagnetic elements embedded within the top surface of the rotatable platen and means for activating and deactivating the electromagnetic elements.

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Gilbert, AZ, United States of America

Gene Hempel