Dynaloy, LLC

Versum Materials Us, LLC

Gene Goebel

Kimberly Dona Pollard

John M Atkinson

Michael Tod Phenis

Raymond Chan

Diane Marie Scheele

Lauri Kirby Kirkpatrick

Lauri Renee Johnson

Resist stripping agents useful for fabricating circuits and/or forming electrodes on semiconductor devices for semiconductor integrated circuits and/or liquid crystals with reduced metal and metal alloy etch rates (particularly copper etch rates and TiW etch rates), are provided with methods for their use. The preferred stripping agents contain low concentrations of resorcinol or a resorcinol derivative, with or without an added copper salt, and with or without an added amine to improve solubility of the copper salt. Further provided are integrated circuit devices and electronic interconnect structures prepared according to these methods.

Metal conservation with stripper solutions containing resorcinol

Improved stripper solutions for removing photoresists from substrates are provided that typically have freezing points below about +15&#xb0; C. and high loading capacities. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulation can additionally contain a secondary solvent. Methods for use of the stripping solutions are additionally provided.

Dynamic multi-purpose composition for the removal of photoresists and method for its use

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Danville, CA, United States of America

Gene Goebel