Bayer Aktiengesellschaft

Pechiney Electrometallurgie

Ge Bayer Silicones Gmbh & Co. Kg

Solarworld Aktiengesellschaft

Weilburger Lackfabrik J. Grebe Gmbh

Gebhard Wagner

Bruno Degen

Elke Licht

Jan Mazanek

Manfred Schulze

Kurt Feldner

Karl-Heinz Kasler

Hans-Heinrich Moretto

Ottfried Schlak

Manfred Schulze, Deceased

Karl-Heinz Ott

Hans-Dieter Block

Rainer Weber

Leslaw Mleczko

Friedemann Muller

Karl Fuhr

John Mitchell Huggins

Hans-Ulrich Meier-Westhues

Thomas Margaria

Hubertus Eversheim

Werner Joseph

Knud Werner

Johannes-Peter Schäfer

Hans-Joachim Leimkühler

Hans Rinkes

Matthias-Sven Steiner

Sabine Schlitte

Dietmar Schwanke

Klaus-Peter Minuth

Karl-Heinz K Asler

Alfred B Orsting

Jurgen Herber

The invention relates to a method for the production of high purity silicon, characterized by the following steps: a) reaction of metallic silicon with silicon tetrachloride (SiCl), hydrogen (H) and hydrochloric acid (HCl) at a temperature of 500 to 800&#xb0; C. and a pressure of 25 to 40 bar to give a trichlorosilane-containing (SiHCl) feed gas stream, b) removal of impurities from the resultant trichlorosilane-containing feed gas stream by scrubbing with condensed chlorosilanes at a pressure of 25 to 40 bar and a temperature of 160 to 200&#xb0; C. in a multi-stage distillation column, to give a purified trichlorosilane-containing feed gas stream and a solid-containing chlorosilane suspension and a distillative separation of the purified feed gas stream into a partial stream essentially comprising SiCland a partial stream, essentially comprising SiHCl, c) disproportionation of the SiHCl-containing partial stream to give SiCland SiH, whereby the disproportionation is carried out in several reactive/distillative reaction zones, with a counter-current of vapour and liquid, on catalytic solids at a pressure of 500 mbar to 50 bar and SiHClis introduced into a first reaction zone, the lower boiling SiH-containing disproportionation product produced there undergoes an intermediate condensation in a temperature range of &#x2212;25&#xb0; C. to 50&#xb0; C., the non-condensing SiH-containing product mixture is fed to one or more further reactive/distillative reaction zones and the lower boiling product thus generated, containing a high proportion of SiHis completely or partially condensed in the head condenser and d) thermal decomposition of the SiHto give high purity silicon.

Method for production of high purity silicon

Coating mixtures, method of producing them and their use for coating

Novel mixtures containing in the anhydrous state at least one polysiloxane, at least one reactive extender, at least one unreactive pigment and/or an unreactive extender, at least one lamellar or fibrous solid, at least one reactive (oligo)silane, optionally together with further additives, to a production process and to the use thereof.

Mixtures, process for the production thereof and use thereof for coatings

The process for producing alkylhalogenosilanes, which comprises reacting a physical mixture of silicon, a selenium or tellurium promoter and a copper catalyst with an alkyl halide.

Process for producing alkylhalogenosilanes

A thermoplastic moulding composition containing at least one sinterable ceramic or metal powder and a mixture of thermoplastic binders, wherein one of the binders is a silicone resin and the second binder is an organic resin. The silicone resin has the a softening point of 40.degree. to 150.degree. C. and an average formula of:

Thermoplastic moulding compounds, a process for their preparation and a

Metallurgical silicon containing phosphorus for the preparation of

The present invention relates to novel polysiloxane-polyether-based copolymers which contain T units and comprise randomly linked organopolysiloxane units and linear polyether units, to a method for their preparation and their use.

Branched polysiloxane-polyether-based copolymers, their preparation and

Fine particle silicon containing surface-bound halogen, a process for

Novel mixtures containing at least one polysiloxane and at least one reactive filler, at least one pigment and/or unreactive filler and optionally other additives, their preparation and use in coating. Preferably they are largely free of organic polymers.

Method for the preparation and use of new mixtures for coatings

Metallic silicon for the Rochow-Synthesis is reduced to particles measuring at least 5 mm in their smallest dimension and 15 mm in their largest dimension, cooling the silicon from a temperature of at least 700.degree. C. to at most 120.degree. C. within a maximum of 2 seconds, and then ground and reacted.

Process for the preparation of organochlorosilanes

The invention relates to powder-form polymer mixtures of silicone resins (B) and thermoplastic polymers (A), to their production and to their use for the modification of thermoplatics.

Use of silicone resins as flameproofing agents

A process for the preparation of alkyl halogenosilanes comprising reacting silicon with alkyl halide in the presence of a copper catalyst and promoter substances and phosphorous and phosphorous compounds in combination with indium or indium compounds or aluminum or aluminum compounds or a mixture of aluminum or aluminum compounds and indium or indium compounds.

Process for the preparation of alkyl halogenosilanes

In the production of organochlorosilanes by reaction of silicon with an alkyl- and/or arylchloride in the presence of a copper catalyst and, optionally, promoter elements, the improvement wherein the silicon has been atomized with an inert gas, has a particle size of less than about 1000 .mu.m, by weight has an Al content of about 0.05 to 0.38%, a Ca content of about 0.02 to 0.2% and an Fe content of about 0.25 to 0.55%.

Process for the production of organochlorosilanes

In the production of an organochlorosilane by reaction of silicon or a silicon alloy with an alkyl or aryl chloride in the presence of a copper catalyst, the improvement which comprises employing the silicon or alloy in atomized form.

Process for the production of organosilanes

In a two-layer enamelling process in which the ground coat and surface coat powders are electrostatically applied to metallic substrates and subsequently baked together, the improvement which comprises employing a ground coat powder having an electrical resistivity of about 10.sup.10 to 10.sup.14 ohm. cm and a surface coat powder having an electrical resistivity of about 10.sup.14 to 10.sup.16 ohm. cm. Advantageously the surface tension of the ground coat amounts to at least about 0.280 N/m and the surface tension of the surface coat to at most about 0.260 N/m, the difference between the surface tensions of the ground coat and surface amounts to at least about 0.050 N/m, the ground coat powder has an electrical resistivity 10.sup.12 to 10.sup.14 ohm. cm and at least about 10.sup.2 ohm. cm lower than that of the surface coat powder, the ground coat powder contains at least one of an alkaline earth metal, zinc, manganese or iron oxide in a total concentration of about 20 to 30% by weight, the zinc oxide content not exceeding about 12% by weight and the manganese oxide plus iron oxide content not exceeding about 9% by weight, about 3 to 5% by weight of finely divided iron oxide is added to the ground coat powder before adjustment of its electrical resistivity, and the ground coat powder is applied in such a quantity that, after baking, the ground coat has a layer thickness of about 0.02 to 0.03 mm.

Single-bake two-layer enamelling with electrostatic powder coating

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Odenthal, Germany

Gebhard Wagner